Highly sensitive sensor for noxious gases using transparent conductive CuAlO2 thin film via molecular beam epitaxy

Highly sensitive sensor for noxious gases using transparent conductive CuAlO2 thin film via molecular beam epitaxy
复制标题

采用分子束外延透明导电 CuAlO2 薄膜的高灵敏度有毒气体传感器

DOI:
10.1016/j.sna.2022.113895
复制
发表时间:
2022-09
期刊:
Sensors and Actuators: A. Physical
影响因子:
--
通讯作者:
白昱
白昱
中科院分区:
其他
文献类型:
--
作者:
揣雅惠;苏钿城;岳丹;白昱

文献摘要

参考文献

相似文献

采用分子束外延技术制备了高灵敏度的p型半导体CuAlO 2薄膜低温有害气体传感器。结构、形貌和光学性质表明,CuAlO 2薄膜具有高质量的单晶结构,表面粗糙,在可见光-近红外(IR)波段具有高的透过率(>85%)。系统研究了CuAlO 2薄膜对CH 4、H2S、CO和NO等有毒和爆炸性气体的还原气敏性能。在90 °C和300 ppb的极低检测水平下,CuAlO 2薄膜对NO气体表现出优异的响应,响应时间(17 s)和恢复时间(68 s)都很短。CuAlO 2传感器也表现出良好的重现性。通过比较CuAlO 2薄膜的电荷输运特性,阐明了CuAlO 2薄膜的NO气敏机理,表明CuAlO 2薄膜在低浓度和低工作温度下的气敏性能增强归因于薄膜的高质量和导电性。因此,CuAlO 2薄膜在人体健康和环境监测方面具有相当大的应用潜力。
Molecular beam epitaxy was used to prepare highly sensitive low-temperature sensors for noxious gases using p-type semiconductor CuAlO2thin films. Structural, morphological, and optical properties revealed that the CuAlO2films had a high-quality single-crystal structure with a rough surface and high transparency (>85%) in the visible-light–near-infrared (IR) band. Systematic investigations were carried out to examine the reduction gas sensing properties of the CuAlO2thin films for toxic and explosive gases such as CH4, H2S, CO, and NO. At 90 °C and at very low detection levels of 300 ppb, the CuAlO2films displayed excellent response to NO gas; the response time (17 s) and recovery time (68 s) were both very short. The CuAlO2sensor also showed excellent reproducibility. The NO gas sensitivity mechanism of the CuAlO2thin film was elucidated by comparing charge transport properties, which revealed that the enhanced gas sensing performance at the low concentration and the low operating temperature are attributed to the high-quality and conductivity of the film. Thus, CuAlO2thin films have considerable application potential for human health and environmental monitoring.
DOI: 10.1063/1.1784888
发表时间: 2004-09
影响因子: 4
作者:
Xu-Guang Zheng;K. Taniguchi;A. Takahashi;Yongxun Liu;Chao‐Nan Xu
通讯作者: Xu-Guang Zheng;K. Taniguchi;A. Takahashi;Yongxun Liu;Chao‐Nan Xu
DOI: 10.1016/j.snb.2006.01.026
发表时间: 2006-12-07
影响因子: 8.4
作者:
Barazzouk, S.;Tandon, R. P.;Hotchandani, S.
通讯作者: Hotchandani, S.
DOI: 10.1007/s10971-009-2143-7
发表时间: 2010-01
影响因子: 2.5
作者:
Gang Li;Xuebin Zhu;H. Lei;Haifeng Jiang;W. Song;Zhaorong Yang;J. Dai;Yuping Sun;Xu Pan;Songyuan Dai
通讯作者: Gang Li;Xuebin Zhu;H. Lei;Haifeng Jiang;W. Song;Zhaorong Yang;J. Dai;Yuping Sun;Xu Pan;Songyuan Dai
DOI: 10.1088/2053-1591/ab78c8
发表时间: 2019-12-01
影响因子: 2.3
作者:
Chuai, Ya-Hui;Bai, Yu;Yue, Dan
通讯作者: Yue, Dan
DOI: 10.1016/j.snb.2004.12.112
发表时间: 2005-07-22
影响因子: 8.4
作者:
Min, BK;Choi, SD
通讯作者: Choi, SD