High-quality ZnO inverse opals and related heterostructures as photocatalysts produced by atomic layer deposition
High-quality ZnO inverse opals and related heterostructures as photocatalysts produced by atomic layer deposition
复制标题
通过原子层沉积生产高品质 ZnO 反蛋白石和相关异质结构作为光催化剂
DOI:
10.1016/j.apsusc.2018.05.160
复制
发表时间:
2018-10
影响因子:
6.7
通讯作者:
Wang Yongsheng
中科院分区:
文献类型:
--
作者:
Long Jie;Fu Ming;Li Caixia;Sun Cuifeng;He Dawei;Wang Yongsheng
ZnO with various nanostructures is widely investigated for high photoelectrochemical (PEC) catalysis performances due to its abundant and inert semiconducting properties with elevated electronic mobility and variable morphologies. Because the solar energy conversion efficiencies could possibly be further enhanced by the introduction of nanophotonic structures with larger surface ratios, high-quality ZnO inverse opals (IOs) were achieved by ALD method using O3as the oxidant. The intrinsic UV emission peaks and PEC currents of ZnO IOs produced by O3atomic layer deposition (ALD) method were much improved when compared to those made by H2O ALD and electrodeposition. ALD at higher temperatures (240 °C) can further enhance the crystalline quality and PEC performances. The optimal ALD thickness and filling fraction obtained by controlling ALD cycles, as well as the optimal photonic stop band position obtained by colloidal crystals with different sphere diameters were also discussed. It was found that conformally coated samples with TiO2protection layers by ALD method using titanium tetrachloride as a precursor enhanced the photochemical stability of ZnO IOs. The photocorrosion was further reduced by inserting ALD Al2O3inside the TiO2protection layers. Heterostructured photonic crystals with double-layer IO structures with different pore periodicities were also developed for enhancing the PEC performances.
登录
查看更多内容
影响因子:
5.2
作者:
Barick, K. C.;Singh, Sarika;Bahadur, D.
通讯作者:
Bahadur, D.
影响因子:
3.7
作者:
Liu, Mingzhao;Nam, Chang-Yong;Zhang, Lihua
通讯作者:
Zhang, Lihua
影响因子:
15
作者:
M. Shim;P. Guyot-Sionnest
通讯作者:
M. Shim;P. Guyot-Sionnest
影响因子:
10.8
作者:
Park, JH;Kim, S;Bard, AJ
通讯作者:
Bard, AJ
影响因子:
4
作者:
Moonju Cho;D. Jeong;Jaehoon Park;Hong-bae Park;S. Lee;T. Park;C. Hwang;G. Jang;Jaehack Jeong
通讯作者:
Moonju Cho;D. Jeong;Jaehoon Park;Hong-bae Park;S. Lee;T. Park;C. Hwang;G. Jang;Jaehack Jeong