Elucidation of spore-photoproduct formation by isotope labeling.
Elucidation of spore-photoproduct formation by isotope labeling.
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DOI:
10.1002/anie.201005228
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发表时间:
2010-12-17
影响因子:
16.6
通讯作者:
Li, Lei
中科院分区:
文献类型:
--
作者:
Lin, Gengjie;Li, Lei
UV light is lethal to most microorganisms owing to its relatively high energy and efficient absorption by biomacromolecules. However, bacterial endospores, which are responsible for a number of human diseases, such as anthrax and tetanus, are extremely resistant to UV radiation. For example, some Bacillus spores can be 100 times more resistant to UV light than the corresponding vegetative cells.[1] The highly unusual UV resistance is due to unique DNA photochemistry coupled with efficient damage repair in endospores.[2–8] Progress has been made in the elucidation of the damagerepair process.[6–9] However, although SP was discovered nearly half a century ago,[10] and despite the strong interest of the scientific community in how it is formed,[2, 11] little is known about the mechanism of spore-DNA photochemistry.[12]Thymine (T) is the most UV-sensitive nucleobase.[12] In typical cells after photochemical excitation, a T residue can dimerize with an adjacent T residue to generate cyclobutane pyrimidine dimers and pyrimidine (6–4) photoproducts. In contrast, the dominant DNA photoproduct in endospores is a unique thymine dimer, 5-thyminyl-5, 6-dihydrothymine, also called spore photoproduct or SP.[13] Spores express a specific enzyme, spore photoproduct lyase (SPL), which effectively reverses SP-dimer formation at the early germination phase and thus enables spores to resume their normal life cycle (Scheme 1).[2, 13]
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DOI:
10.1073/pnas.0708244105
发表时间:
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