Mitigating dust particle contamination in an afterglow plasma by controlled lifting with a DC electric field
Mitigating dust particle contamination in an afterglow plasma by controlled lifting with a DC electric field
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通过直流电场控制提升来减轻余辉等离子体中的尘埃颗粒污染
DOI：
10.1088/1361-6463/ad1148
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发表时间：
2023
期刊：
影响因子：
--
通讯作者：
Goree, J.
中科院分区：
文献类型：
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作者：
Chaubey, Neeraj;Goree, J.
由于等离子体处理引起的颗粒污染激发了在等离子体的功率被关闭之后的时间间隔内电提升颗粒的方法的设计。小的固体尘埃粒子具有电荷，直到等离子体余辉的后期阶段才被冻结。超过这个时间，在它们落到下面的表面并导致缺陷之前，可以通过施加适当的直流（DC）电场以受控的方式提升颗粒，正如我们在实验中所证明的那样。在氩等离子体的电容耦合射频功率被切断后的几毫秒，施加垂直DC电场。此后，视频成像显示粒子的下落减慢或完全停止，这取决于向上电力的大小。
Particle contamination due to plasma processing motivates the design of a method of electrically lifting particles in a time interval after a plasma's power is turned off. Small solid dust particles have electric charges that are not frozen until a late stage of the plasma afterglow. Beyond that time, before they fall to a surface below and cause defects, particles can be lifted in a controlled manner by applying an appropriate direct-current (DC) electric field, as we demonstrate experimentally. A few milliseconds after an argon plasma's capacitively coupled radio-frequency power is switched off, a vertical DC electric field is applied. Thereafter, video imaging shows that the falling of the particles is slowed or stopped altogether, depending on the magnitude of the upward electric force.
脉冲等离子体中中性阻力的作用实现了颗粒污染控制
DOI：
--
发表时间：
2023
期刊：
Advanced Lithography
影响因子：
--
作者：
J. Beckers;J. V. van Huijstee;P. Blom;Federico Medini;T. Peijnenburg
通讯作者：
T. Peijnenburg