Nanoscale Characterization in Resist Processing by using Atomic Force Microscope
Nanoscale Characterization in Resist Processing by using Atomic Force Microscope
复制标题
使用原子力显微镜对抗蚀剂加工进行纳米级表征
DOI：
10.2494/photopolymer.18.729
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发表时间：
2005
影响因子：
0.8
通讯作者：
A. Kawai
中科院分区：
文献类型：
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作者：
A. Kawai
随着原子力显微镜（AFM）的发明，我们已经配备了适当的工具，以澄清在纳米尺度上的凝聚态物质的表面和界面特性。作为AFM在抗蚀剂加工中的应用，本文作者已经研究了抗蚀剂图形粘附、杨氏模量估计、表面硬化层的针尖压痕分析和聚合物聚集体的操纵。此外，浸没式光刻的纳米气泡分析进行了分析。原子力显微镜技术为抗蚀剂工艺设计提供了有用的信息。
With the invention of the atomic force microscope (AFM), we have been equipped with the appropriate tools to clarify surface and interface properties of condensed matter on nanometer scale. As an application of AFM on resist processing, the present author has already studied resist pattern adhesion, Young's modulus estimation, Surface hardened layer analysis by tip indentation and manipulation of polymer aggregate. Moreover, nanobubble analysis for immersion lithography has been analyzed. The AFM technique gives useful information to the field of the designing of resist processing.
针尖压痕法分析光刻胶图案表面的内聚性能
DOI：
--
发表时间：
2004
期刊：
J. Photopolymer Science and Technology 17・3
影响因子：
--
作者：
Akira Kawai;Masahito Hirano;Takayoshi Niiyama;Akira Kawai
通讯作者：
Akira Kawai