Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films
Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films
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用于多层薄膜除碳的氩/氢感应耦合等离子体的表征
DOI：
10.3390/coatings13020368
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发表时间：
2023-02
期刊：
影响因子：
3.4
通讯作者：
Rainer Kling
中科院分区：
文献类型：
--
作者：
Yi Wang;Tim Gehring;Qihao Jin;Jan Dycke;Rainer Kling
使用氩/氢 (Ar/H2) 混合物进行感应耦合等离子体是许多表面处理问题的潜在解决方案，特别是在光学 X 射线和极紫外仪器中遇到碳污染时。使用 Ar/H2 等离子体去除多层薄膜上的碳污染可以延长上述器件的使用寿命。为了进一步研究等离子体和碳之间的反应，采用了光学发射光谱法和多物理场有限元方法。结果表明，巴尔默线的强度与模拟模型中自由基氢原子的密度非常一致，显示出对混合比的依赖性。在输入功率为 165 W、总压为 5 Pa 时，约 35 ± 5% 氢气的最佳混合比产生最高密度的氢自由基，与最高的碳去除率一致。这表明Ar/H2等离子体的除碳主要受氢自由基密度控制，混合比对除碳率有显着影响。
Inductively coupled plasma with an argon/hydrogen (Ar/H2) mixture is a potential solution to many surface treatment problems, especially when encountering carbon contamination in optical X-ray and extreme ultraviolet instruments. Removing carbon contamination on multilayer thin films with Ar/H2 plasma extends the lifetime of the above devices. To further investigate the reaction between plasma and carbon, both optical emission spectroscopy and finite element method with multiphysics fields were employed. The results demonstrated that the intensities of the Balmer lines were in good agreement with the densities of the radical hydrogen atoms from the simulation model, showing a dependence on the mixing ratio. At an electrical input power of 165 W and a total pressure of 5 Pa, an optimum mixing ratio of about 35 ± 5 % hydrogen produced the highest density of hydrogen radicals, coinciding with the highest carbon removal rate. This shows that the carbon removal with Ar/H2 plasma was mainly controlled by the density of hydrogen radicals, and the mixing ratio showed a significant impact on the removal rates.
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影响因子：
0.3
作者：
E. Malykhin;D. Lopaev;A. Rakhimov;T. Rakhimova;O. V. Braginskii;A. Kovalev;A. Vasil’eva;S. Zyryanov
通讯作者：
E. Malykhin;D. Lopaev;A. Rakhimov;T. Rakhimova;O. V. Braginskii;A. Kovalev;A. Vasil’eva;S. Zyryanov
影响因子：
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作者：
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影响因子：
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作者：
Masanao Tsumaki;Tsuyohito Ito
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Masanao Tsumaki;Tsuyohito Ito
DOI：
10.1038/s41377-021-00621-7
发表时间：
2021-09-06
期刊：
Light, science & applications
影响因子：
--
作者：
Mao P;Liu C;Li X;Liu M;Chen Q;Han M;Maier SA;Sargent EH;Zhang S
通讯作者：
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影响因子：
4
作者：
S. Espinho;E. Felizardo;E. Tatarova;F. Dias;C. Ferreira
通讯作者：
S. Espinho;E. Felizardo;E. Tatarova;F. Dias;C. Ferreira