Monolayer Single-Crystal 1T'-MoTe2 Grown by Chemical Vapor Deposition Exhibits Weak Antilocalization Effect.
Monolayer Single-Crystal 1T'-MoTe2 Grown by Chemical Vapor Deposition Exhibits Weak Antilocalization Effect.
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DOI:
10.1021/acs.nanolett.6b01342
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发表时间:
2016-07-13
期刊:
影响因子:
10.8
通讯作者:
Johnson AT
中科院分区:
文献类型:
--
作者:
Naylor CH;Parkin WM;Ping J;Gao Z;Zhou YR;Kim Y;Streller F;Carpick RW;Rappe AM;Drndić M;Kikkawa JM;Johnson AT
Growth of transition metal dichalcogenide (TMD) monolayers is of interest due to their unique electrical and optical properties. Films in the 2H and 1T phases have been widely studied but monolayers of some 1T′-TMDs are predicted to be large-gap quantum spin Hall insulators, suitable for innovative transistor structures that can be switched via a topological phase transition rather than conventional carrier depletion [Qian et al. Science 2014, 346, 1344–1347]. Here we detail a reproducible method for chemical vapor deposition of monolayer, single-crystal flakes of 1T′-MoTe2. Atomic force microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy, and transmission electron microscopy confirm the composition and structure of MoTe2 flakes. Variable temperature magnetotransport shows weak antilocalization at low temperatures, an effect seen in topological insulators and evidence of strong spin–orbit coupling. Our approach provides a pathway to systematic investigation of monolayer, single-crystal 1T′-MoTe2 and implementation in next-generation nanoelectronic devices.
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