Quantum-confinement-induced periodic surface states in two-dimensional metal-organic frameworks
Quantum-confinement-induced periodic surface states in two-dimensional metal-organic frameworks
复制标题
二维金属有机框架中量子限制诱导的周期性表面态
DOI:
10.1063/5.0026372
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发表时间:
2020-11
影响因子:
4
通讯作者:
Chang Liu
中科院分区:
文献类型:
--
作者:
Chun-Sheng Zhou;Xiang-Rui Liu;Yue Feng;Xiji Shao;Meng Zeng;Kedong Wang;Min Feng;Chang Liu
Recently, a series of single-layer metal–organic frameworks (MOFs) was theoretically predicted to be two-dimensional organic topological.materials. However, the experimental evidence of their nontrivial topological states has not been found. Here, combining the use of angleresolved photoemission spectroscopy and scanning tunneling microscopy, we report the electronic structure studies on a single-layer.Cu-coordinated 2,4,6-tri(4-pyridyl)-1,3,5-triazine (Cu-T4PT) MOF supported by a Cu(111) substrate and identify periodic surface states.with the period of the Cu-T4PT reciprocal lattice. These periodic surface states, which have identical features to the Cu(111) Shockley surface.states, can be attributed to the quantum confinement of the surface states of the underlying Cu(111) substrate by the network lattices of the.Cu-T4PT MOF. Our work indicates that the surface states of the metal substrate can be tailored in a controlled manner by the network structures of MOFs with different periodic lattices. The lack of intrinsic bands and the possible topological properties of the single-layer Cu-T4PT.MOF may be attributed to the strong electronic coupling between the Cu-T4PT MOF and the Cu(111) substrates. In order to exploit organic.topological materials predicted in MOFs, it is necessary to grow them on weak van der Waals interaction substrates in the future.
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影响因子:
56.9
作者:
Koenig, Markus;Wiedmann, Steffen;Zhang, Shou-Cheng
通讯作者:
Zhang, Shou-Cheng
DOI:
10.1021/acs.jpcc.8b03353
发表时间:
2018-07
期刊:
The Journal of Physical Chemistry C
影响因子:
--
作者:
Haohao Sun;Shijing Tan;M. Feng;Jin Zhao;H. Petek
通讯作者:
Haohao Sun;Shijing Tan;M. Feng;Jin Zhao;H. Petek
影响因子:
56.9
作者:
Lobo-Checa, Jorge;Matena, Manfred;Stoehr, Meike
通讯作者:
Stoehr, Meike
影响因子:
56.9
作者:
Xu, Su-Yang;Belopolski, Ilya;Hasan, M. Zahid
通讯作者:
Hasan, M. Zahid
影响因子:
56.9
作者:
Reis, F.;Li, G.;Claessen, R.
通讯作者:
Claessen, R.