Silicon-based electroluminescent polycrystalline Er-doped Yb3Al5O12 nanofilms fabricated by atomic layer deposition
Silicon-based electroluminescent polycrystalline Er-doped Yb3Al5O12 nanofilms fabricated by atomic layer deposition
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原子层沉积硅基电致发光多晶掺铒Yb3Al5O12纳米薄膜
DOI:
10.1016/j.jallcom.2020.154964
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发表时间:
2020-08
影响因子:
6.2
通讯作者:
Jiaming Sun
中科院分区:
文献类型:
--
作者:
Jianzhao Liu;Zhongtao Ouyang;Yang Yang;Jiaming Sun
By virtue of the sub-nanometer compositional regulation realized via atomic layer deposition, polycrystalline Er-doped Yb3Al5O12(YbAG:Er) garnet nanofilms are fabricated on silicon after annealing above 1100 °C. The crystalline feature is insensitive to slight deviation from the stoichiometric ratio (Yb:Al = 3:5 for Yb3Al5O12). The nanolaminate devices based on YbAG:Er films present Er-related 1531 nm electroluminescence exhibiting the external quantum efficiency of 2.7–5.2% and the power efficiency of 2.4–4.8 × 10−4, whose fluorescence lifetime is estimated as 1–1.2 ms. The doped Er3+ions are impact-excited by hot electrons stemming from Fowler-Nordheim tunneling mechanism within the Yb3Al5O12matrix. This work is believed to lay the basis for manipulating multi-oxide nanofilms with designed composition and crystallinity, and developing optoelectronic devices from Si-based crystalline garnet films.
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