One-dimensional simulation of hydrogen production kinetic models by water vapor plasmolysis in a DBD plate reactor
One-dimensional simulation of hydrogen production kinetic models by water vapor plasmolysis in a DBD plate reactor
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DBD 板式反应器中水蒸气等离子体分解产氢动力学模型的一维模拟
DOI：
10.1007/s40094-020-00376-3
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发表时间：
2020
期刊：
影响因子：
--
通讯作者：
Y. Hayakawa
中科院分区：
文献类型：
--
作者：
Mostafa El-Shafie;S. Kambara;Y. Hayakawa
开发了板式反应器中使用非热放电等离子体从水蒸气解离制氢的一维瞬态模拟模型的结果。在 573 K 的水蒸气温度和相同的边界条件下模拟了三种不同的水蒸气解离反应机制途径模型。根据反应机理，利用电子水蒸气的电子碰撞截面。详细描述了电子附着和脱离过程；此外，还考虑了表面电荷积累、带电物质的重组、正离子和负离子的产生和损失。电子密度、电场、电势、电子温度和氢质量分数随时间推移显示在等离子体放电间隙中。第一个模型被描述为直接水蒸气分解为其组成元素氢和氧分子。结果表明，随着时间的推移，等离子体放电间隙中形成的氢分子不断增加。在模型II中，模拟反应机理路径包括H2O+、OH+和O+离子的产物。发现由于等离子体间隙内的带电物质，放电间隙上的电势和电场发生显着变化。在模型III中，引入了H−自由基，它通过电子脱离反应控制H原子的产生。这些模拟模型最有趣的结果是氢分子随着时间的推移穿过等离子体间隙的增长。此外，观察到模型III产生的氢气质量分数高于模型II和模型I。
The results of one-dimensional time-dependent simulation modeling of hydrogen production from water vapor dissociation using non-thermal discharge plasma in a plate-type reactor were developed. Three different water vapor dissociation reaction mechanisms pathway models were simulated at a water vapor temperature of 573 K and same boundary conditions. The electron collision cross sections of electron water vapor were utilized based on the reaction mechanisms. The electron attachment and detachment processes were described in detail; additionally, the surface charge accumulation, recombination of charged species, positive and negative ions production and losses are considered. The electron density, electric field, electric potential, electron temperature and the hydrogen mass fraction are presented across the plasma discharge gap and over time. The first model was described as direct water vapor decomposition into their constituent’s elements hydrogen and oxygen molecules. It was revealed that the formed hydrogen molecules increased across the plasma discharge gap over time. In model II, the simulation reaction mechanisms pathway included products of H2O+, OH+, and O+ions. It was found a significant change in the electric potential and electric field across the discharge gap due to the charged species inside the plasma gap. In model III, it was introduced H−radicals which controlled H atoms production by the electron detachment reaction. The most interesting results of these simulation models were the growing of hydrogen molecules across the plasma gap over time. Further, it was observed that the produced hydrogen mass fraction from model III was higher than model II and model I.
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影响因子：
1.5
作者：
T. Maehara;H. Toyota;M. Kuramoto;A. Iwamae;Atsushi Tadokoro;S. Mukasa;H. Yamashita;A. Kawashima;S. Nomura
通讯作者：
T. Maehara;H. Toyota;M. Kuramoto;A. Iwamae;Atsushi Tadokoro;S. Mukasa;H. Yamashita;A. Kawashima;S. Nomura
H2O 和 D2O 的电子轰击电离从阈值到 1000 eV 的绝对部分横截面
影响因子：
4.4
作者：
H. C. Straub;B. Lindsay;K. A. Smith;R. Stebbings
通讯作者：
R. Stebbings
与边缘等离子体杂质相关的 CO、CO2 和 H2O 电子碰撞的分析截面
影响因子：
1.8
作者：
T. Shirai;Tatsuo Tabata;H. Tawara
通讯作者：
H. Tawara
K. Kobayashi：“通过固态氢键自组装卟啉阵列：正交卟啉-双间苯二酚系统”Chem。
DOI：
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发表时间：
--
期刊：
影响因子：
--
作者：
通讯作者：
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电子和离子与水蒸气的碰撞
DOI：
10.1088/0022-3727/26/1/002
发表时间：
1993
期刊：
Journal of Physics D
影响因子：
--
作者：
T. Dolan
通讯作者：
T. Dolan