Light assisted CO2 reduction with methane over SiO2 encapsulated Ni nanocatalysts for boosted activity and stability
Light assisted CO2 reduction with methane over SiO2 encapsulated Ni nanocatalysts for boosted activity and stability
复制标题
在 SiO2 封装的 Ni 纳米催化剂上用甲烷光辅助还原 CO2,以提高活性和稳定性
DOI:
10.1039/c7ta00704c
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发表时间:
2017-05
影响因子:
11.9
通讯作者:
Ye Jinhua
中科院分区:
文献类型:
--
作者:
Liu Huimin;Meng Xianguang;Thang Duy Dao;Liu Lequan;Li Peng;Zhao Guixia;Nagao Tadaaki;Yang Liuqing;Ye Jinhua
In this study, earth-abundant methane was adopted as the reductant in CO2 photoreduction (CRM) for energy storage. Light was introduced into the thermally driven reaction system with the aim to improve the catalytic performance of catalysts at low temperatures. Ni-based nanocatalysts of different morphologies were first adopted in light assisted CRM and some interesting phenomena were observed. One is that, with light irradiation, boosted initial catalytic activities were observed over all the Ni nanocatalysts. Hot electrons resulted from Ni plasmonic property and interband transition facilitated reactant activation and participated in the initial activity enhancement. Another phenomenon is that improved stability could be observed over yolk–shell Ni@SiO2-yolk and core–shell Ni@SiO2-core catalysts with light irradiation. Characterization of the spent catalysts revealed that, over the encapsulation-structured catalysts, with light irradiation, the amounts of deposited graphitic carbon increased with the sacrifice of active carbon deposition, and the smaller amount of detrimental active carbon deposition was regarded to be responsible for the improved stability. To the best of our knowledge, this study for the first time reports that light irradiation could exert effects on carbon formation behavior; meanwhile, it offers an approach to improve the activity and stability of nanocatalysts in CO2 photoreduction.
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影响因子:
4
作者:
Bower, C;Zhou, O;Jin, SH
通讯作者:
Jin, SH
影响因子:
22.1
作者:
Boukha, Zotihair;Jimenez-Gonzalez, Cristina;Lopez-Fonseca, Ruben
通讯作者:
Lopez-Fonseca, Ruben
影响因子:
7.3
作者:
Chen, Y;Ciuparu, D;Pfefferle, L
通讯作者:
Pfefferle, L
影响因子:
3.7
作者:
Ferrari, AC;Robertson, J
通讯作者:
Robertson, J
影响因子:
5.3
作者:
Weiwei Yang;Huimin Liu;Yuming Li;Juan Zhang;Hao Wu;Dehua He
通讯作者:
Weiwei Yang;Huimin Liu;Yuming Li;Juan Zhang;Hao Wu;Dehua He