Atomically resolved scanning tunneling microscopy of hydrogen-terminated Si(001) surfaces after HF cleaning

Atomically resolved scanning tunneling microscopy of hydrogen-terminated Si(001) surfaces after HF cleaning
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HF 清洗后氢封端 Si(001) 表面的原子分辨扫描隧道显微镜

DOI:
10.1063/1.125788
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发表时间:
2000
影响因子:
4
通讯作者:
Y. Mori
Y. Mori
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Kenta Arima;K. Endo;T. Kataoka;Y. Oshikane;H. Inoue;Y. Mori

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通过扫描隧道显微镜研究了 HF 清洗后氢封端的 Si(001) 表面的原子结构。据透露,表面宏观上是粗糙的,但由梯田和台阶组成。在平台内部,形成1×1的结构。这对应于理想的 1×1 二氢化物结构。台阶边缘沿<110>方向延伸。另一方面,当随后用超纯水冲洗表面时,1×1二氢化物结构消失,因为理想的1×1结构的每隔一个二氢化物行优先在超纯水中蚀刻。
Atomic structures of hydrogen-terminated Si(001) surfaces after HF cleaning are investigated by scanning tunneling microscopy. It is revealed that the surface is macroscopically rough but is composed of terraces and steps. Inside a terrace, 1×1 structures are formed. This corresponds to the ideal 1×1 dihydride structure. The step edges run along the 〈110〉 direction. On the other hand, the 1×1 dihydride structure disappears when the surface is subsequently rinsed with ultrapure water, because every other dihydride row of the ideal 1×1 structure is preferentially etched in ultrapure water.
DOI: 10.1116/1.575980
发表时间: 1989-05-01
期刊: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
影响因子: --
作者:
CHABAL, YJ;HIGASHI, GS;BURROWS, VA
通讯作者: BURROWS, VA