Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin: Application to Novel Resin Mold for UV Imprint
Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin: Application to Novel Resin Mold for UV Imprint
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用于固化树脂表面改性的光酸和光碱生成单体：在新型 UV 压印树脂模具中的应用
DOI：
10.2494/photopolymer.25.735
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发表时间：
2012
影响因子：
0.8
通讯作者：
M. Shirai
中科院分区：
文献类型：
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作者：
S. Horii;Keisuke Yamane;Haruyuki Okamura;M. Shirai
制备了几种类型的光酸和光碱产生单体。这些单体与多官能丙烯酸酯单体通过365 nm照射固化。将固化树脂的表面暴露于254 nm光以产生亲水表面。具有酸单元（-SO_3H或-COOH）和胺单元（-NH_2）的树脂表面的水接触角分别为25~36 °和38~43 °，取决于树脂组成。采用该树脂固化物制备了具有亲水性表面的UV压印光刻用模具。结果表明，该树脂模具可用于UV-IL，而无需使用脱模剂进行表面处理。
Several types of photoacidand photobase-generating monomers were prepared. These monomers were cured with multi-functional acrylate monomers by irradiation at 365 nm. The surface of the cured resin was exposed to 254nm light to generate hydrophilic surface. Water contact angles of the resin surface having acid units (-SO3H or -COOH) and amine units (-NH2) were 25~36 o and 38~43, respectively, depending on the resin composition. A mold for UV imprint lithography (UV-IL) was prepared using the cured resin with hydrophilic surface. It was shown that the resin mold could be used for UV-IL without surface treatment using demolding agents.
影响因子：
--
作者：
Daisaku Matsukawa;Wakayama Hiroyuki;Kazuyuki Mitsukura;Haruyuki Okamura;Y. Hirai;M. Shirai
通讯作者：
Daisaku Matsukawa;Wakayama Hiroyuki;Kazuyuki Mitsukura;Haruyuki Okamura;Y. Hirai;M. Shirai