The Planar Multipole Resonance Probe: A Minimally Invasive Monitoring Concept for Plasma-Assisted Dielectric Deposition Processes
The Planar Multipole Resonance Probe: A Minimally Invasive Monitoring Concept for Plasma-Assisted Dielectric Deposition Processes
复制标题
平面多极共振探头：等离子体辅助介电沉积过程的微创监测概念
DOI：
10.1109/tmtt.2020.2974835
复制
发表时间：
2020
影响因子：
4.3
通讯作者：
I. Rolfes
中科院分区：
文献类型：
--
作者：
Dennis Pohle;C. Schulz;M. Oberberg;P. Awakowicz;I. Rolfes
在这篇文章中，提出了一种新的微创的方法来监测等离子体在具有挑战性的环境中的介质沉积工艺的基础上的平面多极共振探针（pMRP）。通过将传感器放置在待涂覆的电介质基板的等离子体远端侧上，可以显著减少由于其存在而引起的工艺扰动。由于传感器的电场能够穿透介电层，因此能够实现通过基板的等离子体监督。为了研究增加涂层厚度对广泛的材料和等离子体条件下的测量性能的影响，使用CST Microwave Studio进行了广泛的3-D全波模拟的结果进行了评估。最后，实时监测结果的氩-氧等离子体在溅射沉积与氧化铝在聚对苯二甲酸乙二醇酯（PET）薄膜基板上与外部工艺参数的比较。结果表明所提出的概念的适用性和它的不敏感性额外的介电涂层。
In this article, a novel minimally invasive approach to plasma monitoring in the challenging environment of dielectric deposition processes based on the planar multipole resonance probe (pMRP) is presented. By placing the sensor on the plasma-remote side of a dielectric substrate to be coated, perturbations of the process due to its presence can be significantly reduced. Since the electric field of the sensor is able to penetrate dielectric layers, a plasma supervision through the substrate is enabled. To investigate the effect of increasing coating thicknesses on the measurement performance for a broad spectrum of materials and plasma conditions, the results of extensive 3-D full-wave simulations performed with CST Microwave Studio are evaluated. Finally, real-time monitoring results of an argon–oxygen plasma during a sputter deposition with aluminum oxide on a polyethylene terephthalate (PET) film substrate together with a comparison to external process parameters are presented. The results demonstrate both the applicability of the proposed concept and its insensitivity to additional dielectric coatings.
用于微创等离子体监测的堆叠平面传感器概念
DOI：
10.23919/apmc.2018.8617552
发表时间：
2018
期刊：
2018 Asia-Pacific Microwave Conference (APMC)
影响因子：
--
作者：
D. Pohle;C. Schulz;M. Oberberg;M. Friedrichs;A. Serwa;P. Uhlig;J. Oberrath;P. Awakowicz;I. Rolfes
通讯作者：
I. Rolfes
影响因子：
1
作者：
Friedrichs, M.;Oberrath, J.
通讯作者：
Oberrath, J.