Tribological properties of self-lubricating Ta-Cu films
Tribological properties of self-lubricating Ta-Cu films
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自润滑Ta-Cu薄膜的摩擦学性能
DOI：
10.1016/j.apsusc.2017.11.220
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发表时间：
2018-03
影响因子：
6.7
通讯作者：
Zhou Lingping
中科院分区：
文献类型：
--
作者：
Qin Wen;Fu Licai;Zhu Jiajun;Yang Wulin;Li Deyi;Zhou Lingping
采用磁控溅射法制备了Ta和TaCu薄膜，并研究了薄膜在2N和5N载荷下与Si3N4球的摩擦学性能。两种薄膜的平均晶粒尺寸均小于25 nm。Ta和TaCu薄膜具有相近的硬度。而TaCu膜的磨损率远小于Ta膜。磨损后的XRD、拉曼和XPS测试表明，Ta和TaCu薄膜磨损表面均形成了氧化钽。钽氧化是有效的润滑，降低摩擦系数。因此，在不同载荷下，Ta和TaCu薄膜的摩擦系数都在0.45左右。同时，Cu的加入可以增加膜层的韧性，避免磨屑的产生，使耐磨性显著提高。
In this paper, Ta and TaCu films were deposited by using magnetron sputtering, and the tribological properties of the films against Si3N4balls were investigated under the loads of 2 N and 5 N. The average grain sizes of both films are below 25 nm. Ta and TaCu films have approximate hardness. While the wear rate of TaCu film is much smaller than that of Ta film. Post-wear testing XRD, Raman and XPS revealed the formation of tantalum oxide on the worn surface of both Ta and TaCu films. Tantalum oxidation is effectively lubricating to reduce friction coefficient. So the friction coefficient of both Ta and TaCu film is about 0.45 under different applied loads. Meanwhile, the addition of Cu could increase the toughness of the film, and avoid the generation of wear debris, resulting in a significant increase in wear resistance.
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影响因子：
5
作者：
Binshi Xu;Z. Zhu;Shi-ning Ma;Wei Zhang;Wei-min Liu
通讯作者：
Binshi Xu;Z. Zhu;Shi-ning Ma;Wei Zhang;Wei-min Liu
影响因子：
5.4
作者：
D. Stone;Hongyu Gao;C. Chantharangsi;Chutima Paksunchai-;M. Bischof;D. Jaeger;A. Martini;T. Scharf;S. Aouadi
通讯作者：
D. Stone;Hongyu Gao;C. Chantharangsi;Chutima Paksunchai-;M. Bischof;D. Jaeger;A. Martini;T. Scharf;S. Aouadi
影响因子：
2.4
作者：
E. Ru;M. Dalley;P. Etchegoin
通讯作者：
E. Ru;M. Dalley;P. Etchegoin
影响因子：
6.2
作者：
Duan, Wenbo;Sun, Yanhua;Yu, Lie
通讯作者：
Yu, Lie
影响因子：
2.7
作者：
Chen, X;Vlassak, JJ
通讯作者：
Vlassak, JJ