Chloroplasts move towards the nearest anticlinal walls under dark condition

Chloroplasts move towards the nearest anticlinal walls under dark condition
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黑暗条件下叶绿体向最近的背斜壁移动

DOI:
10.1007/s10265-011-0433-y
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发表时间:
2011
影响因子:
2.8
通讯作者:
M. Wada
M. Wada
中科院分区:
生物学3区
文献类型:
--
作者:
H. Tsuboi;M. Wada

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叶绿体改变其细胞内的位置,以响应其光环境。在黑暗条件下,叶绿体呈现出与光照条件下不同的特殊位置。在这里,我们分析了叶绿体暗定位使用铁线蕨capillus-veneris配子体细胞。当叶绿体转移到黑暗中,在第一个1-5小时,他们向垂周细胞壁接壤的相邻细胞相当迅速。然后,在随后的24-36 h内,它们的速度减慢并逐渐在垂周壁处积累.叶绿体的运动大致可分为两种类型:最初的快速直线运动和后来的缓慢交错运动。当叶绿体积累反应诱导暗适应细胞的部分细胞照射与微束针对细胞的中心,叶绿体向束点从垂周壁。然而,当微束被关闭时,它们移动到最近的背斜壁,如果它们不是最近的,则不会移动到它们的原始位置,这表明它们知道最近的背斜壁的方向,并且在黑暗定位期间没有它们迁移到的特定区域。
Chloroplasts change their intracellular positions in response to their light environment. Under darkness, chloroplasts assume special positions that are different from those under light conditions. Here, we analyzed chloroplast dark positioning using Adiantum capillus-veneris gametophyte cells. When chloroplasts were transferred into darkness, during the first 1–5 h, they moved towards the anticlinal cell walls bordering the adjacent cells rather rapidly. Then, they slowed down and accumulated at the anticlinal walls gradually over the following 24–36 h. The chloroplast movements could be roughly classified into two different categories: initial rapid straight movement and later, slow staggering movement. When the chloroplast accumulation response was induced in dark-adapted cells by partial cell irradiation with a microbeam targeted to the center of the cells, chloroplasts moved towards the beam spot from the anticlinal walls. However, when the microbeam was switched off, they moved to the nearest anticlinal walls and not to their original positions if they were not the closest, indicating that they know the direction of the nearest anticlinal wall and do not have particular areas that they migrate to during dark positioning.
DOI: 10.1007/s10265-008-0165-9
发表时间: 2008-07-01
影响因子: 2.8
作者:
Kodama, Yutaka;Tsuboi, Hidenori;Wada, Masamitsu
通讯作者: Wada, Masamitsu
DOI: 10.1104/pp.105.067371
发表时间: 2005-09-01
期刊: PLANT PHYSIOLOGY
影响因子: 7.4
作者:
Suetsugu, N;Kagawa, T;Wada, M
通讯作者: Wada, M