Laser Nanopatterning of Colored Ink Thin Films for Photonic Devices.
Laser Nanopatterning of Colored Ink Thin Films for Photonic Devices.
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DOI：
10.1021/acsami.7b15713
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发表时间：
2017-11-15
影响因子：
9.5
通讯作者：
Butt H
中科院分区：
文献类型：
--
作者：
AlQattan B;Benton D;Yetisen AK;Butt H
传统的纳米制造方法，如电子束书写和光刻技术，耗时长、成本高、复杂，而且可加工的材料有限。在这里，我们提出了一种纳秒Nd:YAG激光器（532 nm, 220 mJ）的全息Denisyuk反射模式方法，用于从四种油墨颜色（黑色，红色，蓝色和棕色）的薄膜上创建烧蚀纳米图案。我们建立了使用墨水作为不同颜色和吸收范围的记录介质，以快速产生一维几何形状的光学纳米结构。用四种不同类型的油墨制备的光栅具有相同的周期性（840 nm）；然而，它们对单色光和宽带光产生远波长依赖的衍射响应。蓝色和红色墨水构成的纳米光栅在某些波长的衍射效率较高，而黑色和棕色墨水构成的光栅衍射宽带光。这些光栅具有很高的潜力，可以作为低成本的光子结构用于波长相关的光学滤波器。我们预计，基于不同油墨配方的光栅的快速生产可以实现光学应用，如数据存储、光捕获、安全系统和传感器中的全息显示。
Nanofabrication through conventional methods such as electron beam writing and photolithography is time-consuming, high cost, complex, and limited in terms of the materials which can be processed. Here, we present the development of a nanosecond Nd:YAG laser (532 nm, 220 mJ) in holographic Denisyuk reflection mode method for creating ablative nanopatterns from thin films of four ink colors (black, red, blue, and brown). We establish the use of ink as a recording medium in different colors and absorption ranges to rapidly produce optical nanostructures in 1D geometries. The gratings produced with four different types of ink had the same periodicity (840 nm); however, they produce distant wavelength dependent diffraction responses to monochromatic and broadband light. The nanostructures of gratings consisting of blue and red inks displayed high diffraction efficiency of certain wavelengths while the black and brown ink based gratings diffracted broadband light. These gratings have high potential to be used as low-cost photonic structures in wavelength-dependent optical filters. We anticipate that the rapid production of gratings based on different ink formulations can enable optics applications such as holographic displays in data storage, light trapping, security systems, and sensors.
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影响因子：
3.9
作者：
Alqurashi T;Penchev P;Yetisen AK;Sabouri A;Ameen RM;Dimov S;Butt H
通讯作者：
Butt H
影响因子：
7
作者：
Vasconcellos, Fernando da Cruz;Yetisen, Ali K.;Lowe, Christopher R.
通讯作者：
Lowe, Christopher R.
影响因子：
6.7
作者：
Karnakis, D. M.
通讯作者：
Karnakis, D. M.
影响因子：
13.6
作者：
Zhu X;Yan W;Levy U;Mortensen NA;Kristensen A
通讯作者：
Kristensen A
影响因子：
38.3
作者：
Zhu, Xiaolong;Vannahme, Christoph;Kristensen, Anders
通讯作者：
Kristensen, Anders