The effects of radio-frequency CF4 plasma on adhesion properties of vertically aligned carbon nanotube arrays
The effects of radio-frequency CF4 plasma on adhesion properties of vertically aligned carbon nanotube arrays
复制标题
射频CF4等离子体对垂直排列碳纳米管阵列粘附性能的影响
DOI：
10.1016/j.carbon.2018.10.092
复制
发表时间：
2019-02
期刊：
影响因子：
10.9
通讯作者：
Dai Zhendong
中科院分区：
文献类型：
--
作者：
Lu Mingyue;He Qingsong;Li Yang;Guo Feiqian;Dai Zhendong
本文利用射频四氟甲烷(CF4)等离子体对垂直排列的碳纳米管阵列(VACNTs)进行了不同时间的改性，并研究了VACNTs的粘接性能。扫描电子显微镜和拉曼光谱表明，经CF4等离子体处理后的VACNTs保持了完整的取向，但随着处理时间的延长，缺陷和无定形碳的数量增加。X-射线光电子能谱分析表明，随着时间的延长，VACNT中引入了各种官能团，如C单键、C双键、半离子共价C单键F键、共价C单键F键、90 S前的CF2双键、90 S后的CF2双键等。接触角在90 S之前急剧减小，到180 S时明显增加。附着力测试表明，VACNT的附着力是先增大后减小，在90 时达到最大，达到29.3 N/cm2，与未处理的VACNTs相比提高了约39%。可见，极性基团/非极性基团对VACNT的粘接行为起着重要的作用，表面含有极性基团的VACNT经90 S CF4等离子体处理后，粘接强度有了很大提高。
In this paper, vertical aligned carbon nanotube arrays (VACNTs) were modified by radio-frequency tetrafluoromethane (CF4) plasma for different times, and the corresponding adhesion performance of VACNTs was investigated. Scanning electron microscopy and Raman spectroscopy showed that the VACNTs remained intact alignment after CF4plasma treatment, but the defects and amorphous carbon increased with increasing time. X-ray photoelectron spectroscopy showed that various functional groups were introduced with increasing time, such as Csingle bondO bonds, Cdouble bondO bonds, semi-ionic covalent Csingle bondF bonds, covalent Csingle bondF bonds before 90 s, CF2double bondCF2after 90 s. The water contact angle was drastically decreased before 90 s and then obviously increased until 180 s. The adhesion tests showed that the adhesion of the VACNTs firstly increased and then decreased, and the best adhesion strength of 29.3 N/cm2was obtained at 90 s, which improved about 39% compared with the pristine VACNTs. It can be seen that the polar/non-polar groups plays a significant role on the adhesion behavior, and a great improvement of adhesion strength is obtained for the VACNT containing the polar groups on the surface after 90 s CF4plasma treatment.
登录
查看更多内容
DOI：
10.1016/b978-0-12-391927-4.10024-6
发表时间：
1985
期刊：
The European Physical Journal C
影响因子：
--
作者：
J. Israelachvili
通讯作者：
J. Israelachvili
影响因子：
3.6
作者：
N. Tomlin;A. Curtin;J. Lehman;M. White
通讯作者：
N. Tomlin;A. Curtin;J. Lehman;M. White
DOI：
--
发表时间：
2008
期刊：
Progress in Physics
影响因子：
--
作者：
Fu Qiang
通讯作者：
Fu Qiang
影响因子：
4
作者：
N. Plank;Liudi Jiang;R. Cheung
通讯作者：
N. Plank;Liudi Jiang;R. Cheung
影响因子：
64.8
作者：
Autumn, K;Liang, YA;Full, RJ
通讯作者：
Full, RJ