Coverage Optimization for Defect-Tolerance Logic Mapping on Nanoelectronic Crossbar Architectures
Coverage Optimization for Defect-Tolerance Logic Mapping on Nanoelectronic Crossbar Architectures
复制标题
纳米电子交叉架构上的缺陷容错逻辑映射的覆盖优化
DOI：
10.1007/s11390-012-1278-0
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发表时间：
2012-11
影响因子：
0.7
通讯作者：
李斌
中科院分区：
文献类型：
--
作者：
袁博;李斌
Emerging nano-devices with the corresponding nano-architectures are expected to supplement or even replace conventional lithography-based CMOS integrated circuits, while, they are also facing the serious challenge of high defect rates. In this paper, a new weighted coverage is defined as one of the most important evaluation criteria of various defecttolerance logic mapping algorithms for nanoelectronic crossbar architectures functional design. This new criterion is proved by experiments that it can calculate the number of crossbar modules required by the given logic function more accurately than the previous one presented by Yellambalase et al. Based on the new criterion, a new effective mapping algorithm based on genetic algorithm (GA) is proposed. Compared with the state-of-the-art greedy mapping algorithm, the proposed algorithm shows pretty good effectiveness and robustness in experiments on testing problems of various scales and defect rates, and superior performances are observed on problems of large scales and high defect rates.
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DOI：
10.1145/1543438.1543441
发表时间：
2009-07
期刊：
ACM J. Emerg. Technol. Comput. Syst.
影响因子：
--
作者：
M. Crocker;X. Hu;M. Niemier
通讯作者：
M. Crocker;X. Hu;M. Niemier
DOI：
10.1007/978-3-319-44427-7
发表时间：
2016
期刊：
--
影响因子：
--
作者：
通讯作者：
--
DOI：
10.1016/j.sysarc.2008.01.001
发表时间：
2008-08
期刊：
J. Syst. Archit.
影响因子：
--
作者：
Y. Yellambalase;Minsu Choi
通讯作者：
Y. Yellambalase;Minsu Choi
影响因子：
2.4
作者：
T. Hogg;G. Snider
通讯作者：
T. Hogg;G. Snider
DOI：
10.1007/978-3-319-09952-1
发表时间：
2014-09
期刊：
Proceedings of the 2021 Great Lakes Symposium on VLSI
影响因子：
--
作者：
Marco Dorigo;M. Birattari;Xiaodong Li;Manuel López-Ibáñez;Kazuhiro Ohkura;Carlo Pinciroli;T. Stützle
通讯作者：
Marco Dorigo;M. Birattari;Xiaodong Li;Manuel López-Ibáñez;Kazuhiro Ohkura;Carlo Pinciroli;T. Stützle