Analysis of uncertainties in the measurement of the space charge distribution in dielectrics
Analysis of uncertainties in the measurement of the space charge distribution in dielectrics
复制标题
电介质空间电荷分布测量的不确定度分析
DOI:
10.1088/1361-6501/acadfa
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发表时间:
2022-12
影响因子:
2.4
通讯作者:
Yewen Zhang
中科院分区:
文献类型:
--
作者:
Jiaping Pan;Zebin Cao;Feihu Zheng;Yewen Zhang
The results obtained by the commonly used space charge distribution measurement methods are frequently apparent and one-dimensional results of a localized area, and there may be random errors caused by various factors. In this work, three factors—sample thickness uniformity, pressure wave intensity uniformity, and space charge distribution uniformity—that may cause measurement uncertainties are examined. The analysis and evaluation of the experimental data are impacted by the measurement uncertainties, which are particularly noticeable in the experiments of semiconductive electrode-flat polyethylene (PE) samples using the laser-induced pressure propagation (LIPP) method. These factors are investigated separately with several auxiliary experiments, including laser beam spot energy distribution measurement and space charge distribution measurements at different measuring positions on the same uniform sample. A clear and intelligible model is developed to discuss the influence of these factors on the uncertainties in the space charge distribution measurement in dielectrics.
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影响因子:
2.4
作者:
Jiang Cheng;Li Wen-long;Wu An;Yu Wen-yong
通讯作者:
Yu Wen-yong
DOI:
10.1088/0022-3727/30/11/016
发表时间:
1997-06
期刊:
Journal of Physics D
影响因子:
--
作者:
P. Bloss;M. Steffen;H. Schafer;G. Yang;G. Sessler
通讯作者:
P. Bloss;M. Steffen;H. Schafer;G. Yang;G. Sessler
影响因子:
3.6
作者:
LIU, JM
通讯作者:
LIU, JM
影响因子:
5.2
作者:
M. Rath;E. Varadarajan;V. Natarajan;M. Rao
通讯作者:
M. Rath;E. Varadarajan;V. Natarajan;M. Rao
DOI:
10.1109/ichve49031.2020.9280031
发表时间:
2020-09
期刊:
2020 IEEE International Conference on High Voltage Engineering and Application (ICHVE)
影响因子:
--
作者:
Bohong Xu;F. Zheng;Yewen Zhang;Z. An
通讯作者:
Bohong Xu;F. Zheng;Yewen Zhang;Z. An