Competitive adsorption and two-site occupation effects in metal-organic chemical vapor deposition of ZnO
Competitive adsorption and two-site occupation effects in metal-organic chemical vapor deposition of ZnO
复制标题
ZnO金属有机化学气相沉积中的竞争吸附和双位点占据效应
DOI：
10.1063/1.2731529
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发表时间：
2007-04
影响因子：
4
通讯作者：
Zheng, Y. D.
中科院分区：
文献类型：
--
作者：
Shi, Y.;Liu, W.;Sun, X. W.;Kwong, D. L.;Lo, G. Q.;Ye, J. D.;Zhang, R.;Zhu, S. M.;Gu, S. L.;Zheng, Y. D.
通过对竞争吸附和双位占据效应的综合模拟，研究了金属有机化学气相沉积法制备ZnO外延层的生长动力学。所建立的模型，基于Langmuir-Hinshelwood机制，很好地解释了异常的增长率依赖于VI/II的比例为不同的增长制度。结果表明，对于表面反应和传质限制生长，竞争吸附和双位占据效应分别占主导地位的表面吸附过程。提出的动力学模型定量匹配范围广泛的实验，提供了一个新的洞察一般MOCVD生长机制的二元化合物材料。
The growth dynamics of ZnO epilayers by metal-organic chemical vapor deposition have been investigated by a comprehensive modeling of the competitive adsorption and two-site occupation effects. The established model, based on Langmuir-Hinshelwood mechanism, well explains the abnormal growth rate dependence on the VI/II ratio for different growth regimes. It is found that, for surface reaction and mass-transport limited growth, the competitive adsorption and two-site occupation effects dominate the surface adsorption process, respectively. The proposed dynamics model quantitatively well matched a wide range of experiments, providing a new insight into the general MOCVD growth mechanism for binary compound materials.
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影响因子：
2.1
作者：
Look, David C.
通讯作者：
Look, David C.
影响因子：
1.8
作者：
Jiandong Ye;S. Gu;Shunming Zhu;Songmin Liu;Wei Liu;Xin Zhou;Liqun Hu;Rong Zhang;Yi Shi;Youdou Zheng
通讯作者：
Jiandong Ye;S. Gu;Shunming Zhu;Songmin Liu;Wei Liu;Xin Zhou;Liqun Hu;Rong Zhang;Yi Shi;Youdou Zheng
影响因子：
1.8
作者：
Jiandong Ye;S. Gu;Shunming Zhu;Tong T. Chen;Liqun Hu;F. Qin;Rong Zhang;Yi Shi;Youdou Zheng
通讯作者：
Jiandong Ye;S. Gu;Shunming Zhu;Tong T. Chen;Liqun Hu;F. Qin;Rong Zhang;Yi Shi;Youdou Zheng
影响因子：
2.3
作者：
D. Schlyer;M. A. Ring
通讯作者：
D. Schlyer;M. A. Ring
影响因子：
3.9
作者：
D. Reep;S. Ghandhi
通讯作者：
D. Reep;S. Ghandhi