Photorefractive photonic crystals fabricated with PMMA and 5CB based materials using three-dimensional colloidal crystals

Photorefractive photonic crystals fabricated with PMMA and 5CB based materials using three-dimensional colloidal crystals
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使用三维胶体晶体以 PMMA 和 5CB 基材料制造的光折变光子晶体

DOI:
10.1039/c3tc30793j
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发表时间:
2013-08
影响因子:
6.4
通讯作者:
Yongsheng Wang
Yongsheng Wang
中科院分区:
材料科学2区
文献类型:
--
作者:
Shulei Li;Ming Fu;Yongna Zhang;Jiahua Duan;Dawei He;Yongsheng Wang

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折射率的变化是光折变材料的关键特性,也是影响光子晶体性能的重要因素。因此,光折变光子晶体是一种有趣的物理光学材料。聚合物分散液晶(PMMA、5CB和C60)是光折变材料的典型基团之一,通过溶剂诱导相分离的方法填充到三维二氧化硅胶体晶体中制备光子晶体。当施加低电压时,阻带向更短的波长移动。利用z扫描和双光束耦合技术,在连续调节阻带波长的同时,研究了光折变光子晶体的几种与带隙有关的光学性质。三阶非线性折射率在光子禁带的边缘得到增强。当阻带波长与激光波长重叠时,光折变衍射效率达到最大值。
The variation of the refractive index is the key property of photorefractive materials and an important factor that affects photonic crystals. Therefore, photorefractive photonic crystals are interesting optical materials in physics. One of the typical groups of photorefractive materials, polymer dispersed liquid crystals (PMMA, 5CB, and C60), are filled into three dimensional silica colloidal crystals by solvent-induced phase separation to fabricate photonic crystals. The stop band shifts to shorter wavelength when a low voltage is applied. By using the z-scan and two-beam coupling technique, several band gap dependent optical properties of photorefractive photonic crystals are studied whilst continuously adjusting the wavelength of the stop band. The third-order nonlinear refractive coefficient is enhanced at the edge of the photonic stop band. The photorefractive diffraction efficiency achieves a maximum value when the stop band wavelength overlaps with the laser beam wavelength.
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