Colloidal monolayer self-assembly and its simulation via cellular automaton model
Colloidal monolayer self-assembly and its simulation via cellular automaton model
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胶体单层自组装及其元胞自动机模型模拟
DOI:
10.1088/1674-1056/23/8/088703
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发表时间:
2014-08
影响因子:
1.7
通讯作者:
Fang Xiao-Tian
中科院分区:
文献类型:
--
作者:
Yin Nai-Qiang;Zhang Wen-Ting;Ke Jia-Xin;Fang Xiao-Tian
A wafer-scale colloidal monolayer consisting of SiO2 spheres is fabricated by a method combining spin coating and thermal treatment for the first time. Moreover, a new cellular automaton model describing the self-assembly process of the colloidal monolayer is introduced. Rather than simulate molecular self-assembly to establish the most energetically favored position, we reconstruct the self-assembly of the colloidal monolayer by adjusting several simple transition rules of a cellular automaton. This model captures the main self-assembly characteristics of SiO2 spheres, including experimental processing time, morphology, and some statistics. It possesses the advantage of less calculation and higher efficiency, paving a new way to simulate a mesoscopic system.
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影响因子:
3.9
作者:
KRALCHEVSKY, PA;NAGAYAMA, K
通讯作者:
NAGAYAMA, K
影响因子:
29.4
作者:
Younan Xia;B. Gates;Yadong Yin;Yu Lu
通讯作者:
Younan Xia;B. Gates;Yadong Yin;Yu Lu
影响因子:
1.7
作者:
Xue Wen-rui;Guo Ya-nan;Zhang Wen-mei
通讯作者:
Xue Wen-rui;Guo Ya-nan;Zhang Wen-mei
影响因子:
13.3
作者:
N. Vogel;Mathieu Jung;N. Bocchio;M. Retsch;M. Kreiter;Ingo Köper
通讯作者:
N. Vogel;Mathieu Jung;N. Bocchio;M. Retsch;M. Kreiter;Ingo Köper
影响因子:
8.6
作者:
Dux, C;Versmold, H
通讯作者:
Versmold, H