Tuning the lattice and magnetic anisotropy of Fe thin films

Tuning the lattice and magnetic anisotropy of Fe thin films
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调整 Fe 薄膜的晶格和磁各向异性

DOI:
10.1016/j.matlet.2013.10.031
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发表时间:
2014-01
期刊:
影响因子:
3
通讯作者:
Wang, Jian-Ping
Wang, Jian-Ping
中科院分区:
材料科学3区
文献类型:
--
作者:
Wang, Hao;Jiang, Yanfeng;Yu, Guang-Hua;Wang, Jian-Ping

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在不同溅射压力下,在MgO单晶衬底上外延生长出不同晶格的Fe(001)薄膜。本文发现,通过改变溅射压力可以调节铁薄膜的四边形和磁各向异性。利用x射线反射率、x射线衍射和振动样品磁强计对Fe薄膜的晶格可调性和磁各向异性进行了表征。在不同的溅射压力下,通过控制原子动能,可以诱导铁原子在MgO衬底上的重排,从而形成了铁薄膜的可调结构和磁性能。
Fe (001) thin films with different crystal lattice were epitaxially grown on single crystal MgO substrates under the various sputtering pressures. It is found in this paper that the tetragonality and magnetic anisotropy of Fe thin film is tuned by varying the working sputtering pressures. The tunability of the crystal lattice and the magnetic anisotropy of Fe films were characterized by X-ray reflectivity, X-ray diffraction and vibrating sample magnetometer. The tunable structure and magnetic properties of Fe thin films may attribute to the rearrangement of Fe atoms on MgO substrate induced by controlling the atomic kinetic energy under different sputtering pressure.
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