Complementation of buried lysine and surface polar residues in a designed heterodimeric coiled coil.
Complementation of buried lysine and surface polar residues in a designed heterodimeric coiled coil.
复制标题
设计的异二聚体卷曲线圈中埋藏赖氨酸和表面极性残基的互补。
DOI:
10.1021/bi025559l
复制
发表时间:
2002
期刊:
影响因子:
2.9
通讯作者:
Lumb,KevinJ
中科院分区:
文献类型:
--
作者:
Campbell,KathleenM;Lumb,KevinJ
The coiled coil is an attractive target for protein design. The helices of coiled coils are characterized by a heptad repeat of residues denotedatog. Residues at positionsaanddform the interhelical interface and are usually hydrophobic. An established strategy to confer structural uniqueness to two-stranded coiled coils is the use of buried polar Asn residues at positiona, which imparts dimerization and conformational specificity at the expense of stability. Here we show that polar interactions involving buried position-aLys residues that can interact favorably only with surfacee‘ org‘ Glu residues also impart structural uniqueness to a designed heterodimeric coiled coil with the nativelike properties of sigmoidal thermal and urea-induced unfolding transitions, slow hydrogen exchange and lack of ANS binding. The position-aLys residues do not, however, confer a single preference for helix orientation, likely reflecting the ability of Lys at positionato from favorable interactions withg‘ ore‘ Glu residues in the parallel and antiparallel orientations, respectively. The Lys-Glu polar interaction is less destabilizing than the Asn-Asna→a‘ interaction, presumably reflecting a higher desolvation penalty associated with the completely buried polar position-agroups. Our results extend the range of approaches for two-stranded coiled-coil design and illustrate the role of complementing polar groups associated with buried and surface positions of proteins in protein folding and design.
登录
查看更多内容
影响因子:
5.6
作者:
Walshaw, J;Woolfson, DN
通讯作者:
Woolfson, DN
影响因子:
5.6
作者:
Rashin,AA;Honig,B
通讯作者:
Honig,B
DOI:
--
发表时间:
1995
期刊:
影响因子:
--
作者:
D. Raleigh;S. Betz;W. DeGrado
通讯作者:
W. DeGrado
影响因子:
5.6
作者:
Eckert, DM;Malashkevich, VN;Kim, PS
通讯作者:
Kim, PS