Influence of temperature on the electrochemical window of boron doped diamond: a comparison of commercially available electrodes.
Influence of temperature on the electrochemical window of boron doped diamond: a comparison of commercially available electrodes.
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DOI：
10.1038/s41598-020-72910-x
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发表时间：
2020-09-24
影响因子：
4.6
通讯作者：
Jackman RB
中科院分区：
文献类型：
--
作者：
McLaughlin MHS;Corcoran E;Pakpour-Tabrizi AC;de Faria DC;Jackman RB
这项工作比较了抛光和未抛光的掺硼金刚石（BDD）电极在高达125 °C的一系列温度下的电化学窗口，其中氢和氧终止。实验在5巴压力下进行，以避免由于气泡形成而引起的并发症。用于确定电化学窗口的替代方法与最常用的方法进行比较，该方法将窗口定义为任意电流密度截止（Jcut-off）值。这种任意方法受到电解质质量传输的严重影响，并且不能用于比较文献中使用不同J截止值的电极。本文提出了一种在给定的测量系统中受实验条件影响较小的线性拟合方法。这使得能够从报告的结果中更准确地比较来自各种金刚石电极类型的相对电化学窗口。通过比较抛光和未抛光的BDD电极，与氢和氧的表面终端，它是确定的BDD电极的电化学窗口变窄，随着温度的升高，活化能报告。
This work compares the electrochemical windows of polished and unpolished boron doped diamond (BDD) electrodes with hydrogen and oxygen terminations at a series of temperatures up to 125 °C. The experiment was run at 5 bar pressure to avoid complications due to bubble formation. An alternative method for determining the electrochemical window is compared to the most commonly used method, which defines the window at an arbitrary current density cut-off (Jcut-off) value. This arbitrary method is heavily influenced by the mass transport of the electrolyte and cannot be used to compare electrodes across literature where different Jcut-off values have been used. A linear fit method is described which is less affected by the experimental conditions in a given measurement system. This enables a more accurate comparison of the relative electrochemical window from various diamond electrode types from reported results. Through comparison of polished and unpolished BDD electrodes, with hydrogen and oxygen surface terminations, it is determined that the electrochemical window of BDD electrodes narrows as temperature increases; activation energies are reported.
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DOI：
10.1021/je800678e
发表时间：
2008-12-01
期刊：
JOURNAL OF CHEMICAL AND ENGINEERING DATA
影响因子：
--
作者：
O'Mahony, Aoife M.;Silvester, Debbie S.;Compton, Richard G.
通讯作者：
Compton, Richard G.
影响因子：
3.9
作者：
Olson, Eric J.;Buehlmann, Philippe
通讯作者：
Buehlmann, Philippe
影响因子：
1.9
作者：
Williams, OA;Jackman, RB
通讯作者：
Jackman, RB
影响因子：
2.2
作者：
Zielinski, Artur;Cieslik, Mateusz;Ryl, Jacek
通讯作者：
Ryl, Jacek
DOI：
10.1116/1.580063
发表时间：
1996-07-01
期刊：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
影响因子：
--
作者：
Baral, B;Chan, SSM;Jackman, RB
通讯作者：
Jackman, RB