Quantificational 4D Visualization of Industrial Electrodeposition.
Quantificational 4D Visualization of Industrial Electrodeposition.
复制标题
工业电镀的定量 4D 可视化
DOI：
10.1002/advs.202101373
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发表时间：
2021-12
期刊：
影响因子：
--
通讯作者：
Fang D
中科院分区：
文献类型：
--
作者：
Jiao H;Qu Z;Jiao S;Gao Y;Li S;Song WL;Wang M;Chen H;Fang D
电沉积是现代社会的一项基础技术，已广泛应用于金属电镀和萃取等领域。然而，极端的反应条件，包括宽的操作温度范围和腐蚀性介质（以熔盐/氧化物体系为例），阻碍了电沉积过程的直接原位观察。为了可视化此类“黑匣子”中的电极动力学，采用 X 射线断层扫描来监测电化学过程和形态的三维 (3D) 演化。得益于X射线的良好穿透性，实现了钛沉积的非破坏性、非接触式原位四维（4D）可视化。实时 3D 重建图像揭示了固体和液体阴极上中尺度 Ti 枝晶的反直觉成核和生长过程。根据3D形貌演化，利用基于有限元方法的模拟方法实现了基于金属Ti扩散和局部场增强协同效应的不寻常机制。这种方法可以根据现场监测的参数及时、准确地调节电沉积过程。更重要的是，基于原位X射线断层扫描和数值模拟的4D技术可以很容易地应用于其他电沉积系统，这将有助于深入了解内部动力学和电沉积条件的精确优化。
Electrodeposition is a fundamental technology in modern society and has been widely used in metal plating and extraction, etc. However, extreme reaction conditions, including wide operation temperature ranges and corrosive media (molten salt/oxide systems as a particular example), inhibit direct in situ observation of the electrodeposition process. To visualize the electrode kinetics in such “black box,” X‐ray tomography is employed to monitor the electrochemical processes and three‐dimensional (3D) evolution of morphology. Benefiting from the excellent penetration of X‐ray, a non‐destructive and non‐contact in situ four‐dimensional (4D) visualization of Ti deposition is realized. Real‐time 3D reconstructed images reveal that the counterintuitive nucleation and growth process of a mesoscale Ti dendrite at both solid and liquid cathodes. According to 3D morphology evolution, unusual mechanism based on synergetic effect of the diffusion of metallic Ti and local field enhancement is achieved utilizing a simulation method based on a finite element method. This approach allows for timely and accurately regulating the electrodeposition process upon in situ monitored parameters. More importantly, the 4D technique upon operando X‐ray tomography and numerical simulation can be easily applied to other electrodeposition systems, which will help deeply understand the internal kinetics and the precise optimization of the electrodeposition conditions.
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影响因子：
64.8
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