Planarization of patterned magnetic recording media to enable head flyability
Planarization of patterned magnetic recording media to enable head flyability
复制标题
图案化磁记录介质的平坦化以实现磁头可飞行性
DOI：
10.1007/s00542-011-1222-1
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发表时间：
2011
期刊：
影响因子：
--
通讯作者：
S. Jin
中科院分区：
文献类型：
--
作者：
Chulmin Choi;Y. Yoon;D. Hong;Y. Oh;F. Talke;S. Jin
研究了图案化磁记录介质的制造和平坦化，并研究了图案化和平坦化的65 mm玻璃盘上的磁记录滑块的飞行能力。首先通过电子束光刻和反应离子蚀刻（RIE）制造具有40 nm直径和60 nm高度的纳米柱阵列的图案化介质的小试样，以研究图案化介质的平坦化过程。由于读/写飞行性测试需要图案化的盘而不是小的试样区域，因此我们准备了65 mm直径（2.5 in.）的图案化玻璃盘。结合RIE使用所谓的“Ag球化工艺”。这种“Ag球化工艺”允许在大面积上制造纳米尺寸的位图案，即，在直径为65 mm的圆盘上。通过旋涂用氢倍半硅氧烷（HSQ）进行图案化区域的平坦化。使用RIE对HSQ层进行背蚀刻，得到光滑表面。“飞行性测试”表明，典型的磁记录滑块在平面化玻璃盘上的飞行稳定性显著提高，飞行高度波动的标准偏差为0.1 nm量级。后一个值与“光滑”磁盘的值相当。
The fabrication and planarization of patterned magnetic recording media is investigated and the flyability of magnetic recording sliders on a patterned and planarized 65 mm glass disk is investigated a small coupon of patterned media with an array of nano pillars of 40 nm diameter and 60 nm height was first fabricated by e-beam lithography and reactive ion etching (RIE) to investigate the planarization process for patterned media. Since read/write flyability tests require a patterned disk rather than a small coupon area, we have prepared a bit patterned glass disks of 65 mm diameter (2.5 in.) using the so-called “Ag ball-up process” in combination with RIE. This “Ag ball-up process” permits the manufacturing of a nano-sized bit patterns on a large area, i.e., on a disk with 65 mm diameter. Planarization of the patterned area was performed with hydrogen silsesquioxane (HSQ) by spin coating. The HSQ layer was back-etched using RIE, resulting in a smooth surface. “Flyability testing” indicates significantly improved flying stability of typical magnetic recording sliders on the planarized glass disks, with the standard deviation of flying height fluctuations on the order of 0.1 nm. The latter value is comparable to that of “smooth” disks.
氧等离子体辐射对室温纳米压印复制的氢倍半硅氧烷纳米图案的影响
DOI：
--
发表时间：
2006
期刊：
Japanese Journal of Applied Physics Vol.45
影响因子：
--
作者：
Masanori Kawamori;Ken-ichiro Nakamatsu;Yuichi Haruyama;Shinji Matsui
通讯作者：
Shinji Matsui
影响因子：
2.1
作者：
Richter, H. J.;Dobin, A. Y.;Brockie, R. M.
通讯作者：
Brockie, R. M.