Measurement of the secondary electron emission from CVD diamond films using phosphor screen detectors
Measurement of the secondary electron emission from CVD diamond films using phosphor screen detectors
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使用荧光屏检测器测量 CVD 金刚石薄膜的二次电子发射
DOI:
10.1088/1748-0221/10/03/p03004
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发表时间:
2015
影响因子:
1.3
通讯作者:
Vaz R
中科院分区:
文献类型:
--
作者:
Vaz R
Diamond-based photomultipliers have the potential to provide a significant improvement over existing devices due to diamond's high secondary electron yield and narrow energy distribution of secondary electrons which improves energy resolution creating extremely fast response times. In this paper we describe an experimental apparatus designed to study secondary electron emission from diamond membranes only 400 nm thick, observed in reflection and transmission configurations. The setup consists of a system of calibrated P22 green phosphor screens acting as radiation converters which are used in combination with photomultiplier tubes to acquire secondary emission yield data from the diamond samples. The superior signal voltage sampling of the phosphor screen setup compared with traditional Faraday Cup detection allows the variation in the secondary electron yield across the sample to be visualised, allowing spatial distributions to be obtained. Preliminary reflection and transmission yield data are presented as a function of primary electron energy for selected CVD diamond films and membranes. Reflection data were also obtained from the same sample set using a Faraday Cup detector setup. In general, the curves for secondary electron yield versus primary energy for both measurement setups were comparable. On average a 15–20% lower signal was recorded on our setup compared to the Faraday Cup, which was attributed to the lower photoluminescent efficiency of the P22 phosphor screens when operated at sub-kilovolt bias voltages.
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影响因子:
1.3
作者:
Lapington J
通讯作者:
Lapington J
DOI:
10.1088/0022-3727/20/9/008
发表时间:
1987-09
期刊:
Journal of Physics D
影响因子:
--
作者:
M. E. Woods;B. Hopkins;G. Matthews;G. Mccracken;P. Sewell;H. Fahrang
通讯作者:
M. E. Woods;B. Hopkins;G. Matthews;G. Mccracken;P. Sewell;H. Fahrang
影响因子:
3.2
作者:
J. Yater;A. Shih;J. Butler;P. Pehrsson
通讯作者:
P. Pehrsson
影响因子:
2.1
作者:
S. Michaelson;V. Richter;R. Kalish;A. Hoffman;E. Cheifetz;R. Akhvlediani
通讯作者:
R. Akhvlediani
影响因子:
4.1
作者:
D. M. Trucchi;E. Cappelli;N. Lisi;P. Ascarelli
通讯作者:
D. M. Trucchi;E. Cappelli;N. Lisi;P. Ascarelli