Preparation of Protective MoSi2 Coating on Niobium Substrate
Preparation of Protective MoSi2 Coating on Niobium Substrate
复制标题
铌基体MoSi2保护涂层的制备
DOI：
10.1007/s11666-015-0258-7
复制
发表时间：
2015-06
影响因子：
3.1
通讯作者：
Chen Fang
中科院分区：
文献类型：
--
作者：
Yan JianHui;Wang Yi;Liu LongFei;Wang Yueming;Chen Fang
通过空气等离子喷涂、退火和硅化在 Nb 基体上制备了 MoSi2 保护涂层。研究了等离子喷涂Mo层退火对后续制备MoSi2涂层的影响。在 1200 °C 的空气中研究了 MoSi2 涂层的氧化行为。通过 X 射线衍射和扫描电子显微镜对 MoSi2 涂层的相组成和微观结构进行了表征。高温退火显着降低了喷涂态 Mo 涂层的孔隙率（从 9.6% 降至 2.1%）。真空退火后，喷镀层的片晶界和层状组织消失，Mo镀层出现再结晶组织。在硅化过程中，MoSi2 涂层从喷涂的 Mo 涂层表面脱落。退火Mo层表面制备的MoSi2涂层具有致密的微观结构，涂层与Nb基体之间表现出良好的界面结合。该涂层具有多层结构，外层为MoSi2，中间层为Mo，内层为Mo-Nb合金。 MoSi2 涂层在 1200°C 空气中表现出优异的抗氧化性。
A protective MoSi2 coating on Nb substrate was prepared by air plasma spraying and annealing followed by siliconizing. The influence of annealing for plasma-sprayed Mo layer on the subsequent preparation of MoSi2 coating was investigated. Oxidation behavior of the MoSi2 coating was investigated at 1200 °C in air. Phase constituents and microstructure of the MoSi2 coating were characterized by x-ray diffraction and scanning electron microscopy. High-temperature annealing significantly decreases the porosity of the as-sprayed Mo coating (from 9.6 to 2.1%). After vacuum annealing, the splat boundaries and lamellar microstructure of the as-sprayed coating disappear and the recrystallized structure of the Mo coating appears. The MoSi2 coating falls off from the surface of the as-sprayed Mo coating during siliconizing process. The MoSi2 coating prepared on the annealed Mo layer surface has a dense microstructure, which shows a good interface bond between the coating and the Nb substrate. The coating has a multilayer structure, with MoSi2 outer layer, Mo middle layer, and Mo-Nb alloy inner layer. The MoSi2 coating exhibits an excellent oxidation resistance at 1200 °C in air.
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铌基原位复合材料Mo-Si-B涂层的显微组织和抗氧化性能
影响因子：
8.3
作者：
Jingyan Wu;Wan Wang;Chungen Zhou
通讯作者：
Chungen Zhou
影响因子：
5.4
作者：
X. Zhao;Z. Ye
通讯作者：
X. Zhao;Z. Ye
DOI：
--
发表时间：
2005
期刊：
--
影响因子：
--
作者：
肖来荣;易丹青;殷磊;蔡志刚
通讯作者：
肖来荣;易丹青;殷磊;蔡志刚
影响因子：
5.4
作者：
Zeinab R. Farag;S. Krüger;G. Hidde;A. Schimanski;C. Jäger;J. Friedrich
通讯作者：
Zeinab R. Farag;S. Krüger;G. Hidde;A. Schimanski;C. Jäger;J. Friedrich
影响因子：
5.2
作者：
P. R. Taleghani;S. Bakhshi;M. Erfanmanesh;G. H. Borhani;R. Vafaei
通讯作者：
P. R. Taleghani;S. Bakhshi;M. Erfanmanesh;G. H. Borhani;R. Vafaei