Single-layer microfluidic current source via optofluidic lithography
Single-layer microfluidic current source via optofluidic lithography
复制标题
通过光流控光刻的单层微流控电流源
DOI：
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发表时间：
2015
期刊：
影响因子：
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通讯作者：
L. Lin
中科院分区：
文献类型：
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作者：
C. Glick;S. Peng;M. Chung;K. Korner;M. Veale;C. Liu;J. Moore;A. Chu;A. Buckley;K. Iwai;R. Sochol;L. Lin
这项工作标志着首次使用原位光聚合来创建单层微流体设备，该设备用作超低雷诺数（Re）电流源，以独立于操作压力调节流体流速。自主流体部件是微/纳流体回路和应用的新兴方面;然而，许多现有的流体应用需要特定的压力和/或流速条件以最佳地执行，并且许多需要复杂且昂贵的制造过程。在这里，我们介绍了单层微流体系统，它利用弹簧和活塞系统-通过光流体光刻原位制造-被动地将流体流速约束到一个独立于操作压力的值。实验结果表明，控制的流速为29.2 ± 0.8 μl/min（从P = 50-100 mbar），最大小信号电阻率为141.1 mbar-min/μl，这代表了低压微流控电流源的最高性能。
This work marks the first use of in-situ photopolymerization to create single-layer microfluidic devices which serve as ultra-low Reynolds Number (Re) current sources to regulate fluid flow rate independent of operating pressures. Autonomous fluidic components are an emerging aspect of micro/nanofluidic circuits and applications; however, many existing fluidic applications require specific pressure and/or flow rate conditions to perform optimally, and many require complex and expensive fabrication procedures. Here we introduce single-layer microfluidic system which utilize a spring and piston system - fabricated in situ via optofluidic lithography - to passively constrain fluid flow rate to a value independent of operating pressure. Experimental results revealed controlled flow rates of 29.2 ± 0.8 μl/min (from P = 50-100 mbar) and a maximum small-signal resistivity of 141.1 mbar-min/μl, which represents the highest performance for a low-pressure microfluidic current source.
影响因子：
56.9
作者：
Unger, MA;Chou, HP;Quake, SR
通讯作者：
Quake, SR