Interfacial Phenomena in Liquid Metal and Semiconductor Separation Processes

液态金属和半导体分离过程中的界面现象

• 批准号: 8513606
• 负责人: William Gill
• 金额: $ 3.97万
• 依托单位: SUNY at Buffalo
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1986
• 资助国家: 美国
• 起止时间: 1986-03-01 至 1987-08-01
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8513606&HistoricalAwards=false
• 关键词: Interfacial; Phenomena; Liquid; Metal; Semiconductor

Fundamental Rayleigh-Benard type experimental and theoretical studies are performed to measure for the first time the effect of interfacial phenomena on the stability and structure of thermocapillary and buoyancy driven conection in low Prandtl number liquid metal and semiconductor fluids. The experiments will be carried out on liquid tin and lead heated from below and will utilize an ultrahigh vacuum system with an ion sputter gun and a unique Auger and ELS analysis capability for establishing and maintaining atomically clean surfaces at working temperatures for extended periods of time. The system allows for measuring monolayer concentration levels of surface active materials. Stability limits and surface morphology will be verified for low Prandtl number fluids experimentally for both the onset of convection and the nonlinear transition to oscillatory convection modes as a function of solute concentration, evaporation rates and aspect ratio. Theoretical studies designed to guide and interpret the experimental work will include two and three dimensional analyses of instability and bifurcation phenomena in fluid layers. The effect of interfacial phenomena, including surface concentraion, vapor recoil, surface adsorption and deflection will be studied in detail.

基本Rayleigh-Benard型实验和理论研究 首次测量了界面 热毛细现象的稳定性和结构， 低普朗特数液态金属中的浮力驱动连接， 半导体流体 实验将在液体中进行 锡和铅从下面加热，并将利用真空 带有离子溅射枪和独特俄歇和ELS分析系统 建立和保持原子级清洁表面的能力 在工作温度下长时间使用。 系统 允许测量表面活性剂的单层浓度水平 材料. 将验证稳定性限度和表面形态 对于低普朗特数流体， 对流和向振荡对流模式的非线性转变 作为溶质浓度、蒸发速率和 比例 理论研究旨在指导和解释 实验工作将包括二维和三维分析， 流体层中的不稳定性和分叉现象。 的影响 界面现象，包括表面浓缩，蒸气反冲， 将详细研究表面吸附和偏转。