Novel Approaches To Electrodeposition Of Compound Semi- Conductors

化合物半导体电沉积的新方法

• 批准号: 8617850
• 负责人: Krishnan Rajeshwar
• 金额: $ 24.96万
• 依托单位: University of Texas at Arlington
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1987
• 资助国家: 美国
• 起止时间: 1987-03-01 至 1990-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8617850&HistoricalAwards=false
• 关键词: Novel; Approaches; Electrodeposition; Compound; Semi

The proposal addresses a novel inexpensive approach to electrodeposition of compound semi-conductors. This method offers unique advantages for the fabrication of thin films of compound semi-conductors for photovoltaic, electronic, and optical applications. The PIs propose to investigate the following areas: 1. new deposition schemes to improve the quality of the films; 2. new semiconducting materials, such as layered chalcogenides and ternary compounds; 3. A comprehensive model of the electrodeposition process for compound semi-conducting materials; The research will be addressed by an interdisciplinary team of a chemist and an electrical engineer from two institutions. The research proposed has important technological implications and the outcome of this research can advance the science base significantly.

该提案提出了一种新的廉价的电沉积方法 化合物半导体 这种方法提供了独特的优势， 复合半导体薄膜的制备 光伏、电子和光学应用。 PI建议 调查以下领域： 1. 改进薄膜质量的新沉积方案; 2. 新型半导体材料，如层状硫属化物， 三元化合物; 3. 电沉积过程的综合模型 复合半导体材料; 这项研究将由一个由化学家组成的跨学科小组进行。 和两个机构的电气工程师。 研究提出， 具有重要的技术意义， 研究可以大大推进科学基础。