Investigations on High Brightness Gaseous Field Ion Sources
Investigations on High Brightness Gaseous Field Ion Sources
批准号:
8702461
负责人:
Benjamin Siegel
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
1987
资助国家:
美国
项目状态:
已结题
起止时间:
1987-07-01 至 1990-06-30
中文摘要
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英文摘要
The PI has developed an H(2)+ gaseous field ion source that produces a highly columnated ion beam of high angular current density and low energy spread. The PI proposes to extend the gaseous field ion source to several other ion species using different gases. The characteristics will be used to determine the required conditions of temperture, gas pressure, fields, etc. for gaseous sources using helium, the rare gases, 0(2), N(2), and some gaseous hydride, e.g. silane (SiH(4)), phosphine (PH(3)), Arsine (AsH(3)) and diborane (B(2)H(6)) will be investigated.
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会议论文
Computer Image Processing of High Resolution Scanning Transmission Electron Micrographs
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批准号:8516867
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项目类别:Continuing Grant
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资助金额:$28.61万
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财政年份:1986
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负责人:Benjamin Siegel
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依托单位:
Digital Image Processing of High Resolution Electron Microscope Images
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批准号:8205894
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1982
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负责人:Benjamin Siegel
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依托单位:
Digital Image Processing of High Resolution Electron Microscope Images
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批准号:7916897
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项目类别:Standard Grant
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资助金额:$1.0万
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财政年份:1980
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负责人:Benjamin Siegel
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依托单位:
Digital Image Processing of High Resolution Electron Microscope Images
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批准号:7909093
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1979
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负责人:Benjamin Siegel
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依托单位:
Electron Microscopy and Electron Optics For Biomolecular Investigations
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批准号:7421709
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1975
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负责人:Benjamin Siegel
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依托单位:
海外基金