Sputtering Facility for Undergraduate Students

本科生溅射设施

• 批准号: 8750009
• 负责人: John Fox
• 金额: $ 0.91万
• 依托单位: Indiana University of Pennsylvania
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1987
• 资助国家: 美国
• 起止时间: 1987-04-15 至 1989-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8750009&HistoricalAwards=false
• 关键词: Sputtering; Facility; Undergraduate; Students

The Department of Physics at Indiana University of Pennsylvania will purchase a sputtering system and associated equipment which will become a part of a new high vacuum system. The present system, purchased with local funds, contains resistive heating and electron beam evaporators. The addition of the sputtering system will allow students to learn about this important technique and to study properties of amorphous thin films, properties of optical coatings, the preparation of interesting Hall effect films, the fabrication of semiconductor devices, and to use materials which have not been accessible with present techniques.

宾夕法尼亚印第安纳州大学物理系将 购买溅射系统和相关设备， 一个新的高真空系统的一部分 目前的系统，购买 当地资金，包含电阻加热和电子束蒸发器。 溅射系统的加入将使学生了解 这一重要技术，并研究非晶薄膜的性能 薄膜，光学薄膜的性能，感兴趣的 霍尔效应膜、半导体器件的制造和应用 用现有技术还不能获得的材料。