The Preparation of Superconducting Thin Films by the Decomposition of Metal-Organic Complexes

金属有机配合物分解制备超导薄膜

• 批准号: 8803184
• 负责人: Aaron Wold
• 金额: $ 37.25万
• 依托单位: Brown University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1988
• 资助国家: 美国
• 起止时间: 1988-06-01 至 1991-11-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8803184&HistoricalAwards=false
• 关键词: Preparation; Superconducting; Thin; Films; Decomposition

Thin films of superconducting oxides containing copper will be prepared by decomposing volatile metalorganic complexes. The films will be characterized and compared with bulk materials. Attempts will be made to deposit the films on perovskite and MgO substrates in order to ascertain if added stability could be obtained by the use of such substrates. A second goal of the research will be directed towards the utilization of an RF glow discharge to perform plasma-assisted metalorganic chemical vapor deposition (MOCVD). Preliminary studies have indicated that high quality aluminum oxide films can be produced on silicon substrates at temperatures of 350 C by the decomposition and oxidation of aluminum isopropoxide using an RF glow discharge.

含铜超导氧化物薄膜可通过分解挥发性金属有机络合物来制备。 这些薄膜将被表征并与散装材料进行比较。 我们将尝试在钙钛矿和氧化镁基底上沉积薄膜，以确定是否可以通过使用此类基底来获得更高的稳定性。 该研究的第二个目标是利用射频辉光放电进行等离子体辅助金属有机化学气相沉积（MOCVD）。 初步研究表明，通过使用射频辉光放电分解和氧化异丙醇铝，可以在 350°C 的温度下在硅基板上产生高质量的氧化铝薄膜。