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Engineering Research Equipment Grant: Suss MJB 3 UV 400 Mask Aligner

Engineering Research Equipment Grant: Suss MJB 3 UV 400 Mask Aligner
工程研究设备补助金:Suss MJB 3 UV 400 Mask Aligner
批准号:
8805571
负责人:
Michael Melloch
金额:
$4.66万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1988
资助国家:
美国
项目状态:
已结题
起止时间:
1988-09-15 至 1990-02-28

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中文摘要
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英文摘要
It is critical that we acquire a new mask aligner such as the Karl Suss MJB 3. The MJB3 is designed to work with up to 3 inch wafers or with pieces of wafers which is more typical for our GaAs processing. The MJB 3 has gentle substrate handling, and highly sensitive and fragile materials such as GaAs, InP, and InSb can be used. The MJB 3 is also capable of 0.6 um resolution with the optics and exposure system we are requesting.
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Materials Research Science and Engineering Center
  • 批准号:
    9400415
  • 项目类别:
    Cooperative Agreement
  • 资助金额:
    $516.63万
  • 财政年份:
    1994
  • 负责人:
    Michael Melloch
  • 依托单位:
ENGINEERING RESEARCH EQUIPMENT GRANT: Chemical Vapor Deposition System
  • 批准号:
    9310852
  • 项目类别:
    Standard Grant
  • 资助金额:
    $13.2万
  • 财政年份:
    1993
  • 负责人:
    Michael Melloch
  • 依托单位:
Engineering Research Equipment Grant: Reactive Ion Etching System
  • 批准号:
    9006068
  • 项目类别:
    Standard Grant
  • 资助金额:
    $3.56万
  • 财政年份:
    1990
  • 负责人:
    Michael Melloch
  • 依托单位:
MIS (Metal-Insulator-Semiconductor) and SAW (Surface Acoustic Wave) Evaluation of MBE (Molecular Beam Epitaxy) Deposited Passivation Layers on GAAS
  • 批准号:
    8317145
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $17.57万
  • 财政年份:
    1984
  • 负责人:
    Michael Melloch
  • 依托单位:
国内基金
海外基金
Research on Quantum Field Theory without a Lagrangian Description
  • 批准号:
    24ZR1403900
  • 项目类别:
    省市级项目
  • 资助金额:
    --
  • 批准年份:
    2024
  • 负责人:
    SATOSHI NAWATA
  • 依托单位:
Cell Research
Cell Research
Cell Research (细胞研究)