Engineering Research Equipment Grant: Suss MJB 3 UV 400 Mask Aligner
Engineering Research Equipment Grant: Suss MJB 3 UV 400 Mask Aligner
批准号:
8805571
负责人:
Michael Melloch
金额:
$4.66万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1988
资助国家:
美国
项目状态:
已结题
起止时间:
1988-09-15 至 1990-02-28
中文摘要
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英文摘要
It is critical that we acquire a new mask aligner such as the Karl Suss MJB 3. The MJB3 is designed to work with up to 3 inch wafers or with pieces of wafers which is more typical for our GaAs processing. The MJB 3 has gentle substrate handling, and highly sensitive and fragile materials such as GaAs, InP, and InSb can be used. The MJB 3 is also capable of 0.6 um resolution with the optics and exposure system we are requesting.
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Materials Research Science and Engineering Center
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批准号:9400415
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项目类别:Cooperative Agreement
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资助金额:$516.63万
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财政年份:1994
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负责人:Michael Melloch
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依托单位:
ENGINEERING RESEARCH EQUIPMENT GRANT: Chemical Vapor Deposition System
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批准号:9310852
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项目类别:Standard Grant
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资助金额:$13.2万
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财政年份:1993
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负责人:Michael Melloch
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依托单位:
Engineering Research Equipment Grant: Reactive Ion Etching System
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批准号:9006068
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项目类别:Standard Grant
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资助金额:$3.56万
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财政年份:1990
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负责人:Michael Melloch
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依托单位:
MIS (Metal-Insulator-Semiconductor) and SAW (Surface Acoustic Wave) Evaluation of MBE (Molecular Beam Epitaxy) Deposited Passivation Layers on GAAS
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批准号:8317145
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项目类别:Continuing Grant
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资助金额:$17.57万
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财政年份:1984
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负责人:Michael Melloch
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依托单位:
国内基金
海外基金
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