Indo-U.S. Joint Workshop on Materials Processing, Thin Filmsand Applications, Bangalore, India, December 1988, Award in U.S. and Indian Currencies

印度-美国

• 批准号: 8818789
• 负责人: Rointan Bunshah
• 金额: $ 3.62万
• 依托单位: University of California-Los Angeles
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1988
• 资助国家: 美国
• 起止时间: 1988-08-01 至 1989-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8818789&HistoricalAwards=false
• 关键词: Indo; U.S.; Joint; Workshop; Materials

Description: This project supports participation of 12 U.S. scientists in an Indo-U.S. joint workshop on material processing, thin films and applications. The objectives of the workshop are to identify fields of research of mutual interest in the area of material synthesis, process development and applications, and to plan outlines of joint research projects by institutes in the two countries. Topics to be covered include: Deposition technologies with emphasis on plasma assisted techniques; material properties for thin and thick films including tribological, optical, optoelectrical, and semiconductor properties; and current technological applications of candidate materials in specific fields, including mechanisms of failure of coatings and relation to material properties. Scope: The workshop is in an area of great interest to the U.S. and India and where applications are being developed worldwide at a rapid rate. The topics of the workshop are current, and the U.S. P.I is a leader in research in this field. Other proposed U.S. participants are well established researchers who, along with the Indian counterparts, should ensure a successful outcome of the meeting. A report of the results will be produced.

描述：该项目支持12个美国国家的参与。 印度和美国联合举办的材料研讨会上， 加工、薄膜和应用。 的目标 讲习班将确定相互研究领域 对材料合成、工艺 开发和应用，并规划联合 两国研究机构的研究项目。 主题 将涵盖的包括：沉积技术，重点 等离子体辅助技术;薄 和厚膜，包括摩擦学的，光学的， 光电和半导体特性;以及电流 候选材料在特定领域的技术应用 领域，包括涂层失效的机制， 与材料性能的关系。 范围：研讨会是在一个非常感兴趣的领域， 美国和印度以及正在开发应用程序的地区 在世界范围内迅速增长。 研讨会的主题是 目前，美国P.I.是这方面研究的领导者。 领域 其他提议的美国参与者都是公认的 研究人员谁，沿着与印度同行，应该 确保会议取得圆满成功。 的报告 将产生结果。