Indo-U.S. Joint Workshop on Materials Processing, Thin Filmsand Applications, Bangalore, India, December 1988, Award in U.S. and Indian Currencies

描述：该项目支持12名美国科学家参加一个关于材料加工、薄膜和应用的印美联合研讨会。讲习班的目标是确定材料合成、工艺开发和应用领域中共同感兴趣的研究领域，并规划两国研究所联合研究项目的大纲。课程包括：沉积技术，重点是等离子体辅助技术；薄膜和厚膜的材料特性，包括摩擦学、光学、光电和半导体特性；以及当前候选材料在特定领域的技术应用，包括涂层的失效机理和与材料性能的关系。范围：该研讨会位于美国和印度非常感兴趣的领域，该领域的应用程序正在全球范围内快速开发。研讨会的主题是最新的，美国P.I在这一领域的研究中处于领先地位。其他拟议的美国与会者都是知名的研究人员，他们应该与印度同行一起，确保会议取得成功。将制作一份结果报告。

Description: This project supports participation of 12 U.S. scientists in an Indo-U.S. joint workshop on material processing, thin films and applications. The objectives of the workshop are to identify fields of research of mutual interest in the area of material synthesis, process development and applications, and to plan outlines of joint research projects by institutes in the two countries. Topics to be covered include: Deposition technologies with emphasis on plasma assisted techniques; material properties for thin and thick films including tribological, optical, optoelectrical, and semiconductor properties; and current technological applications of candidate materials in specific fields, including mechanisms of failure of coatings and relation to material properties. Scope: The workshop is in an area of great interest to the U.S. and India and where applications are being developed worldwide at a rapid rate. The topics of the workshop are current, and the U.S. P.I is a leader in research in this field. Other proposed U.S. participants are well established researchers who, along with the Indian counterparts, should ensure a successful outcome of the meeting. A report of the results will be produced.