Engineering Research Equipment Grant: Picosecond Excimer Laser Source for Research on VUV/XUV Lasers

工程研究设备补助金：用于 VUV/XUV 激光器研究的皮秒准分子激光源

• 批准号: 8906863
• 负责人: Roland Sauerbrey
• 金额: --
• 依托单位: William Marsh Rice University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1989
• 资助国家: 美国
• 起止时间: 1989-08-01 至 1990-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8906863&HistoricalAwards=false
• 关键词: Engineering; Research; Equipment; Grant; Picosecond

This Engineering Research Equipment Grant will provide funds for an innovative high power picosecond KrF excimer laser system. In its initial stage, the laser will deliver 30 ps pulses with 50 mJ of energy at 248 nm. A newly discovered saturable absorber for KrF will greatly reduce the amplified spontaneous emission problem pertinent to all short-pulse excimer laser systems and will allow for a completely new approach for the construction of such systems. The laser pulse will be used to produce a plasma on a solid target, and the soft x- rays emitted from the plasma will excite inner-shell electrons of molecular vapors. The feasibility of this technique for molecular species has been shown within the PI's NSF funded program (ECS-

这项工程研究设备补助金将为创新的高功率皮秒KrF准分子激光系统提供资金。在初始阶段，激光器将在248 nm处发射30ps脉冲，能量为50mJ。新发现的用于KrF的可饱和吸收体将极大地减少与所有短脉冲准分子激光系统相关的放大自发辐射问题，并将为构建此类系统提供一种全新的方法。激光脉冲将被用来在固体目标上产生等离子体，从等离子体发出的软X射线将激发分子蒸气的内壳层电子。这项技术用于分子物种的可行性已经在PI的NSF资助计划(ECS-