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Aerosol Applications to Thin Film Deposition of Silicon

Aerosol Applications to Thin Film Deposition of Silicon
气溶胶在硅薄膜沉积中的应用
批准号:
9003631
负责人:
Roger Hawk
金额:
$0.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-08-01 至 1992-01-31

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中文摘要
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英文摘要
This research is funded under the National Science Foundation Small Grants for Exploratory Research Program. The primary goal of the research is to extend current aerosol deposition processes and instrumentation to process thin films of silicon. Thin films of silicon powder are deposited on substrates such as silicon, tantalum, titanium, or silicon dioxide. Effects of electrical charging of the powders, powder particle size, subsequent thermal treatment of the deposit, are being studied. The films are being characterized using scanning electron microscopy, X-ray diffraction, and electrical property measurements.
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