Aerosol Applications to Thin Film Deposition of Silicon

气溶胶在硅薄膜沉积中的应用

• 批准号: 9003631
• 负责人: Roger Hawk
• 金额: --
• 依托单位: University of Arkansas Little Rock
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-08-01 至 1992-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9003631&HistoricalAwards=false
• 关键词: Aerosol; Applications; Thin; Film; Deposition

This research is funded under the National Science Foundation Small Grants for Exploratory Research Program. The primary goal of the research is to extend current aerosol deposition processes and instrumentation to process thin films of silicon. Thin films of silicon powder are deposited on substrates such as silicon, tantalum, titanium, or silicon dioxide. Effects of electrical charging of the powders, powder particle size, subsequent thermal treatment of the deposit, are being studied. The films are being characterized using scanning electron microscopy, X-ray diffraction, and electrical property measurements.

这项研究是由国家科学基金会探索性研究小额资助计划资助的。这项研究的主要目标是将目前的气溶胶沉积工艺和仪器扩展到处理硅薄膜。硅粉薄膜被沉积在硅、钽、钛或二氧化硅等衬底上。正在研究粉末的带电、粉末粒度以及随后的热处理对镀层的影响。用扫描电子显微镜、X射线衍射仪和电学性能测量对薄膜进行了表征。