Research Initiation Award: Chemical Vapor Deposition for Tribological Applications

研究启动奖：摩擦学应用的化学气相沉积

• 批准号: 9008414
• 负责人: Dorothy Skaf
• 金额: $ 5.92万
• 依托单位: Villanova University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-08-01 至 1993-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9008414&HistoricalAwards=false
• 关键词: Research; Initiation; Award; Chemical; Vapor

The CVD deposition process will be studied with the goal of controlling and limiting the growth of columnar grains and promoting the growth of fine, equiaxed grains with improved tribological properties. The process development will be based on equilibrium and other thermodynamic calculations, followed by experimental deposition studies and tribological testing. Initial work will concentrate on tungsten carbide films.

将研究CVD沉积过程，以控制和限制柱状晶的生长，并促进具有改善摩擦学性能的细小等轴晶的生长。该工艺的开发将基于平衡和其他热力学计算，然后是实验沉积研究和摩擦学测试。最初的工作将集中在碳化钨薄膜上。