Research Initiation Award: Chemical Vapor Deposition for Tribological Applications

将研究CVD沉积过程，以控制和限制柱状晶的生长，并促进具有改善摩擦学性能的细小等轴晶的生长。该工艺的开发将基于平衡和其他热力学计算，然后是实验沉积研究和摩擦学测试。最初的工作将集中在碳化钨薄膜上。

The CVD deposition process will be studied with the goal of controlling and limiting the growth of columnar grains and promoting the growth of fine, equiaxed grains with improved tribological properties. The process development will be based on equilibrium and other thermodynamic calculations, followed by experimental deposition studies and tribological testing. Initial work will concentrate on tungsten carbide films.