Research Initiation Award: Chemical Vapor Deposition for Tribological Applications

将研究CVD沉积工艺，目标是 控制和限制柱状晶粒的生长， 促进细小等轴晶粒的生长， 摩擦学性能 工艺开发将基于 在平衡和其他热力学计算，其次 通过实验沉积研究和摩擦学测试。 最初的工作将集中在碳化钨薄膜。

The CVD deposition process will be studied with the goal of controlling and limiting the growth of columnar grains and promoting the growth of fine, equiaxed grains with improved tribological properties. The process development will be based on equilibrium and other thermodynamic calculations, followed by experimental deposition studies and tribological testing. Initial work will concentrate on tungsten carbide films.