Research Initiation Award: Microfabrication of Electron Optical Components

研究启动奖：电子光学元件的微加工

• 批准号: 9009842
• 负责人: Alan Feinerman
• 金额: $ 8万
• 依托单位: University of Illinois at Chicago
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-07-01 至 1994-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9009842&HistoricalAwards=false
• 关键词: Research; Initiation; Award; Microfabrication; Electron

Semiconductor processing techniques will be utilized to fabricate electron optical structures. In addition to electron microscopy the results of this research can also be applied to high definition cathode ray tubes (HDCRT), 10um period wigglers, and vacuum microelectronics. The areas considered in this proposal are: . A specimen holder with a binary selection of square apertures in a diaphragm ranging from 1um to 32um on a side, to support ultrathin specimens. . Miniature thermionic electron sources that have a flat emitting surface of varying size. There will be up to 10,000 of these filaments on each substrate. In addition a pseudo- blackbody source of electrons will be fabricated, this will have the advantage of a reduced evaporation of work function lowering impurities for tungsten. . Programmable thermionic electron sources that can control the emitting surface by changing the current path. This feature will add flexibility to the traditional triode design that relies on a Wehnelt electrode to control the emitting area. Electron specimen holders, and sources have been traditionally made with a beaker or in a machine shop. Semiconductor processing techniques developed for integrated circuit manufacture can generate 1-100um patterns in two and three dimensions with appropriate etching. This unprecedented control can be used to greatly improve the ease of manufacture of electron optical components and the resolution in microscopy.

半导体加工技术将被利用 来制造电子光学结构。 除了 电子显微镜，这项研究的结果可以 也可应用于高清晰度阴极射线管 （HDCRT）、10 μ m周期摆动器和真空 微电子学 本文考虑的领域 建议如下： . 一种标本保持器， 膜片上的方形孔， 每侧1 um至32 um，以支持 标本 . 微型电子源， 具有不同尺寸的平坦发射表面。 会有多达10,000根这样的细丝 在每个基板上。 此外，伪- 黑体电子源将是 这将有一个优势， 功函数的减少蒸发 降低钨的杂质。 . 可编程电子源 它可以控制发射表面， 更改当前路径。此功能将 为传统的散热器设计增加了灵活性 依靠一个温纳尔电极来控制 发射区。 电子样品架，和来源已被 传统上用烧杯或机器制作 店 半导体处理技术 为集成电路制造而开发的， 在两个和三个中产生1 - 100 μ m图案 尺寸与适当的蚀刻。 这 前所未有的控制可以用来大大提高 电子光学器件制造容易性 成分和显微镜的分辨率。