Research Initiation Award: Microfabrication of Electron Optical Components
Research Initiation Award: Microfabrication of Electron Optical Components
批准号:
9009842
负责人:
Alan Feinerman
金额:
$8.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-07-01 至 1994-06-30
中文摘要
半导体加工技术将被用于制造电子光学结构。除了电子显微镜,这项研究的结果也可以应用于高清晰度阴极射线管(HDCRT), 10um周期摆动器和真空微电子。本建议审议的领域是:。一种样品夹,在侧面有1um至32um的膜片上有二进制选择的方形孔,以支持超薄样品。具有不同尺寸的平坦发射表面的微型热离子电子源。每个基板上将有多达10,000个这样的细丝。此外,还将制备一种伪黑体电子源,其优点是减少了功函数的蒸发,降低了钨的杂质。可编程热电子源,可以通过改变电流路径来控制发射表面。这一特点将增加灵活性,以传统的三极管设计,依赖于一个Wehnelt电极来控制发射区域。电子样品支架和源传统上是用烧杯或在机械车间制造的。为集成电路制造而开发的半导体加工技术可以通过适当的蚀刻产生1-100um的二维和三维图案。这种前所未有的控制可以大大提高电子光学元件制造的便利性和显微镜的分辨率。
英文摘要
Semiconductor processing techniques will be utilized to fabricate electron optical structures. In addition to electron microscopy the results of this research can also be applied to high definition cathode ray tubes (HDCRT), 10um period wigglers, and vacuum microelectronics. The areas considered in this proposal are: . A specimen holder with a binary selection of square apertures in a diaphragm ranging from 1um to 32um on a side, to support ultrathin specimens. . Miniature thermionic electron sources that have a flat emitting surface of varying size. There will be up to 10,000 of these filaments on each substrate. In addition a pseudo- blackbody source of electrons will be fabricated, this will have the advantage of a reduced evaporation of work function lowering impurities for tungsten. . Programmable thermionic electron sources that can control the emitting surface by changing the current path. This feature will add flexibility to the traditional triode design that relies on a Wehnelt electrode to control the emitting area. Electron specimen holders, and sources have been traditionally made with a beaker or in a machine shop. Semiconductor processing techniques developed for integrated circuit manufacture can generate 1-100um patterns in two and three dimensions with appropriate etching. This unprecedented control can be used to greatly improve the ease of manufacture of electron optical components and the resolution in microscopy.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Ethics in the Details; Collaborative
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批准号:0629393
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项目类别:Standard Grant
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资助金额:$3.8万
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财政年份:2006
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负责人:Alan Feinerman
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依托单位:
MRI: Acquisition of a Raith 150 Electron Beam Lithography System for a Nanofabrication Education, Research Training and Exploration Consortium
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批准号:0216518
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项目类别:Standard Grant
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资助金额:$50.28万
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财政年份:2002
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负责人:Alan Feinerman
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依托单位:
海外基金