MRI: Acquisition of a Raith 150 Electron Beam Lithography System for a Nanofabrication Education, Research Training and Exploration Consortium

0216518费纳曼这笔赠款将允许UIC购买高分辨率电子束光刻设备(RAITH 150)，保证至少50 nm的图案化能力，并且已经证明了亚10 nm的图案化。UIC将把它设置在专门用于光刻的100级洁净室间隔内。选择这种特殊机器的原因将在第3c节“研究仪器和需求的描述”中详细说明，这些原因包括构图性能、计量能力、不同人群的易用性、购买价格和年度维护成本。这台机器将使UIC联盟的其他6个成员(圣母大学、西北大学、普渡大学、加州大学、IIT和NIU)以及UIC周围的一个大型企业基地和一个国家实验室受益。基础科学和工程研究正在进入一个新的时代，在这个时代，纳米材料的基础知识，包括磁性、半导体、超导、电子器件、生物材料、流体和相关的界面现象，将对先进器件和工程系统的设计至关重要。随着器件缩小到最小铁磁区(100-1000 nm)、超导相干长度(~1-100 nm)或生物分子的特征尺寸等自然长度尺度以下，将需要大量的基础研究和创新。这些设备将使这些计划和更多由于篇幅限制而无法在这里描述的计划得以实现：UIC、纳米机构研究和纳米材料注意，纳米电子学和高速电路和设备lIT、纳米电子学NIU、纳米电子学普渡、用于分子水平DNA直接表征和测序的NEMS、用于生物分子检测的二维光电带隙材料UC、用于细胞黏附和迁移的机械研究的电子控制衬底。这些是来自10家公司和9家非营利机构的意向书和意向书。该纳米光刻系统将是伊利诺伊大学芝加哥分校微/纳米制造应用实验室(MAL)的一部分。MAL已成为芝加哥地区的地区性用户设施，在过去3.5年中，其用户基础增加了7倍，超过50%的用户来自UIC以外。这一快速增长是由于MAL提供了一套通用的制造和表征设备的开放和廉价的访问、培训和指导。在PIS设施中增加电子束光刻将使它们能够极大地增加UIC和周围社区对国家纳米倡议的参与。

0216518FeinermanThis grant will allow UIC to purchase a high resolution e-beam lithography equipment (Raith 150) with a minimum of 50nm patterning capability guaranteed and sub-10nm patterning has been demonstrated. UIC will set it up in a class 100 clean room bay devoted exclusively to lithography. The reasons for the selection of this particular machine will be elaborated on in section 3c "Description of Research Instrumentation and Needs," and are the patterning performance, metrology capability, ease of use by a diverse population, purchase price, and annual maintenance cost. This machine will benefit 6 other members of the UIC consortium (Notre Dame, NWU, Purdue, UC, IIT, and NIU) as well as a large corporate base around UIC and a national laboratory. Basic science and engineering research are entering a new era where fundamental knowledge of nanoscale materials including magnetic, semiconductors, superconductors, electronic devices, bio-materials, fluids, and related interface phenomena will be essential for the design of advanced devices and engineered systems. A great deal of basic research and innovation will be needed as devices shrink below the natural length scales like the size of the minimum ferromagnetic domain (100-1000 nm), the superconducting coherence length (~ 1-100 nm), or the characteristic size of bio molecules. The equipment will enable these programs and many more that can not be described here due to space limitations:UIC, Nanomagentism studies, and nanopatterningNote Dame, Nanoelectronics and high-speed circuits and deviceslIT, NanoelectronicsNIU, NanoelectronicsPurdue, NEMS for the Direct DNA Characterization and Sequencing at the Molecular LevelNWU, Two dimensional Photonoic band gap materials for biomolecular detection UC, Electronically controlled substrates for mechanistic studies of cell adhesion and migration.The additional applications mentioned are the 23 letters of support received to support e--beam lithography development at UIC that are in the supplementary documents section. These are letters of interest and intent from 10 companies, and from 9 non-profit institutions. The nano-lithography system will be a part of University of Illinois at Chicago's Micro/Nanofabrication Applications Laboratory (MAL). The MAL has become a regional user facility for the Chicago area and in the last 3.5 years it has increased its user base 7 fold with over 50% of the users coming from outside of UIC. This rapid growth is due to the MAL offering open and inexpensive access, training, and guidance on a versatile set of fabrication and characterization equipment. The addition of e-beam lithography to the PIs facilities will allow them to greatly increase the participation of UIC and the surrounding community in the national nano initiative.