Metal Colloids and Thin Films

发展中国家科学奖将 支持Kenneth Klabunde的合作， 堪萨斯州立大学和加洛卡德纳斯- 智利Conception大学的Trivino说。 的 该项目旨在（1）制备M-溶剂胶体， Cu、Ag和Sn，并与单体如苯乙烯和 甲基丙烯酸甲酯;（2）表征胶体 颗粒电泳，TEM，SEM，FTIR， 穆斯堡尔谱和SRS;和（3）表征金属 通过TGA，DSC， 微观分析和电阻率测量。 研究人员将使用一种新的方法来制备 使用金属的非水胶体金属颗粒 过冷时原子的蒸发和溶剂化 有机溶剂 移动的金属原子聚集在 变暖 形成的颗粒停止生长， 溶剂化和静电排斥。 各种金属 已显示形成稳定的胶体溶液。 对这些新胶体的主要兴趣在于它们的 用作金属膜前体。 研究人员的目标 开发化学液体（而不是 气相）沉积膜。 凭借最近的一项专利， 许多工业兴趣已经发展起来。 这一联合 预计该项目将促进金属- 胶体、金属膜工作。 美国方面有专业知识 胶体化学和最先进的设备 用于制备和分析胶体溶液， 金属薄膜 智利方面拥有专业知识， 聚合物表征和必要的TGA，DSC， TEM/SEM设备，这是美方所缺乏的。

This Science in Developing Countries award will support the collaboration of Kenneth Klabunde of Kansas State University and Galo Cardenas- Trivino of the University of Conception, Chile. The project aims to (1) prepare M-solvent colloids with Cu, Ag, and Sn, and with monomers such as styrene and methylmethacrylate; (2) characterize colloidal particles by electrophoresis, TEM, SEM, FTIR, Mossbauer, and SRS; and (3) characterize metallic films formed from the colloids by TGA, DSC, microanalyses, and resistivity measurements. The researchers will use a new method for preparing nonaqueous colloidal metal particles, using metal evaporation and solvation of atoms in excess cold organic solvents. The mobile metal atoms cluster upon warming. The forming particles stop growing due to solvation and electrostatic repulsion. Various metals have been shown to form stable colloidal solutions. The major interest in these new colloids is in their use as metallic film precursors. The researchers aim to develop them for chemical liquid (rather than vapor) deposition of films. With a recent patent, much industrial interest has developed. This joint project is expected to facilitate progress in metal- colloid, metal film work. The U.S. side has expertise in colloid chemistry and state-of-the-art equipment for preparing and analyzing colloidal solutions and metal films. The Chilean side has expertise in polymer characterization and necessary TGA, DSC, and TEM/SEM facilities, which the U.S. side lacks.