Novel Radiation-Sensitive Materials

本项目计划开展新型高灵敏度无机/有机金属光引发剂的分子设计、引发机理的阐明以及用于光刻微电子应用的新型辐射敏感材料的评价等基础研究。研究范围包括具有改进的热稳定性、光敏性和波长响应的新型光响应材料。从这些研究中获得的知识将有助于设计新一代光敏材料，以满足微电子、涂料和复印工业日益增长的需求。

This project plans to conduct fundamental research on the molecular design of novel and highly sensitive inorganic/organometallic photoinitiators, elucidation of the mechanism of initiation, and evaluation of new radiation-sensitive materials for photolithographic applications in microelelectronics. The scope of research includes new classes of photoresponsive materials possessing improved thermal stability, photosensitivity, and wavelength response. %%% Knowledge gained from these studies will aid in the design of new generation photosensitive materials required to satisfy the increasingly demanding needs of the microelectronics, coatings, and reprographic industries.