Presidential Young Investigator Award

该项目由总统青年研究者奖资助， 并将重点发展可制造的低温 用于器件生长的化学气相沉积工艺 高质量金属和化合物半导体 微电子器件和电路。 提供配套资金 行业，由主要研究者担保。将使用 通过直接项目支持加强研究工作， 通过大学和工业之间的深入互动， 研究人员 预计整个项目工作将有助于 科学和技术基础，以提高业绩， 电信、计算和通信组件的费用减少 信息处理.

This project is funded by a Presidential Young Investigator award, and will focus on the development of manufacturable low temperature chemical vapor deposition processes for the growth of device quality metals and compound semiconductors for use in advanced microelectronics devices and circuitry. Matching funds from industry, when secured by the principal investigator. will be used to enhance the research efforts by direct project support and through in-depth interactions between university and industrial researchers. The overall project effort is expected to contribute to the scientific and technology base for improved performance and reduced cost of components for telecommunications, computing and information processing.