Presidential Young Investigator

总统青年研究员

• 批准号: 9157796
• 负责人: Brian Thompson
• 金额: $ 20万
• 依托单位: University of Kansas Center for Research Inc
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1991
• 资助国家: 美国
• 起止时间: 1991-07-15 至 1996-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9157796&HistoricalAwards=false
• 关键词: Presidential; Young; Investigator

This grant is to provide research support for Dr. Brian E. Thompson under the National Science Foundation's Presidential Young Investigator Awards Program. Glow discharge (plasma) processing plays a large role in the semiconductor industry. The overall goal of this research is to be able to operate and develop plasma processes better by having (1) increased understanding of the physical phenomena, (2) predictive simulation techniques, and (3) more easily-applied experimental diagnostics. Studying electron and ion concentrations in plasma discharges is a major thrust of this project because these charged particles affect gas-phase reactions and surface phenomena. The goal is to develop non-intrusive techniques to determine electron and ion concentrations and energies in industrially-used reactors. The PI also plans to model charged particles in plasmas. One goal is to create a model that predicts electron and ion energies and concentrations in radio-frequency plasmas. The other goal is to examine and optimize the solution techniques for the model equations. Besides charged-particle analysis, he will examine the reactions of charge-neutral species in the discharge. One long term goal of this modeling is finding a practical way of predicting creation rates of neutral species from electron-molecule collisions as a function of discharge operating parameters. Another goal is to develop experimental techniques, especially frequency response analysis, for determining the applicable rate constants in an operating system. The above will be applied to the low-frequency plasma enhanced chemical vapor deposition of nitrides and oxides and oxygen/nitrogen plasmas for cleaning electronic parts.

这项拨款是为布赖恩·E·博士提供研究支持。 汤普森根据国家科学基金会的总统 青年研究者奖计划。 辉光放电（等离子体）处理在制造过程中起着很大的作用。 半导体行业。 本研究的总体目标是 为了能够更好地操作和开发等离子体工艺， （1）增加对物理现象的理解， (2)预测模拟技术，以及（3）更多 易于应用的实验诊断。 学习电子 等离子体放电中的离子浓度是 因为这些带电粒子会影响 气相反应和表面现象。 目标是 发展非侵入性技术来测定电子和离子 工业反应器中的浓度和能量。 PI还计划对等离子体中的带电粒子进行建模。 一 目标是建立一个模型，预测电子和离子 射频等离子体中的能量和浓度。 的 另一个目标是检查和优化解决方案技术 对于模型方程。 除了带电粒子分析， 他将研究电荷中性物质在 放电 这种建模的一个长期目标是找到一个 有用的方法来 预测中性物种的创造率， 电子-分子碰撞随放电的变化 操作参数 另一个目标是开发实验性的 技术，特别是频率响应分析， 确定适用费率 操作系统中的常量。 上述内容将适用于 低频等离子体增强化学气相沉积 氮化物和氧化物以及氧/氮等离子体， 清洁电子零件。