Theoretical and Simulational Modeling of the Growth & Deposition of Materials

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A research program will be undertaken under the Materials Synthesis and Processing Initiative to develop and apply new theoretical and simulational modeling techniques to problems of growth and deposition of materials. With the development of high resolution experimental techniques as well as recent advances in our theoretical understanding of noneqilibrium surface growth phenomena, it is possible to develop a better understanding of the growth and deposition of materials using theoretical ideas based on continuum models as well as realistic molecular dynamics and Monte Carlo simulations. In particular, the following projects will be undertaken: order-disorder transition in epitaxial growth; strain relaxation in thin film growth; theoretical models of thin film growth; microscopic modeling of chemical vapor deposition and growth instabilities; and, modeling the formation of porous silicon. %%% Analytical and computational modeling will be done to understand the deposition of materials onto substrates and their subsequent growth. This work has an impact on fundamental condensed matter physics and on materials science. In the latter category it directly relates to many materials in which thin films play a critical role such as coatings for corrosion and wear protection; optical coatings; and, microelectronics. This reserach project is part of the FY92 NSF Materials Synthesis and Processing Initiative.