Synchrotron Radiation Investigation of Electronic, Structural and Catalytic Properties of Alkali Metal-Covered Materials

碱金属覆盖材料的电子、结构和催化性能的同步辐射研究

• 批准号: 9223710
• 负责人: Zdenek Hurych
• 金额: $ 24万
• 依托单位: Northern Illinois University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1993
• 资助国家: 美国
• 起止时间: 1993-04-01 至 1996-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9223710&HistoricalAwards=false
• 关键词: Synchrotron; Radiation; Investigation; Electronic; Structural

This project is a continuation of a research program to study the modification of solid surfaces by alkali metal overlayers. The effort focuses on investigating the electronic promotion of surface reactions and on the modification of the electronic and atomic structure of several important semiconductors and metals by alkali overlayers and the catalytic oxidation and nitridation of semiconductors. The project is based on technique of photoelectron spectroscopy using the soft x-ray spectrum provided by the high brilliance 1 GeV electron storage ring at the Synchrotron Radiation Center of the University of Wisconsin-Madison. In addition to the electronic properties, information on the atomic structure of investigated interfaces is provided by the use of the relatively new technique of photoemission extended x-ray absorption fine structure. %%% Knowledge of the atomic and electronic structure of metal semiconductor and semiconductor/oxide interfaces is essential to the basic understanding of these systems, as well as for the optimum performance of current and future electronic devices. This project coveres several experimental spectroscopic techniques using existing national resources at the 1 GeV Synchrotron Radiation Center, at the University of Wisconsin-Madison. The work will provide valuable information on the electronic structure, atomic geometry, and the microscopic mechanisms of important catalytic reactions like oxidation or nitridation of the semiconductor and metal surfaces under investigation. The potential impact of this research on the applied and technological areas of metal/semiconductor interfaces is indicated by two recent U.S. patents.

本项目是研究碱金属覆层对固体表面改性的研究项目的延续。研究的重点是研究电子对表面反应的促进作用，以及碱覆盖层对几种重要半导体和金属的电子和原子结构的修饰，以及半导体的催化氧化和氮化。该项目基于光电子能谱技术，利用威斯康星大学麦迪逊分校同步辐射中心高亮度1 GeV电子存储环提供的软x射线能谱。除了电子性质外，利用相对较新的光发射扩展x射线吸收精细结构技术提供了所研究界面的原子结构信息。了解金属半导体和半导体/氧化物界面的原子和电子结构对于基本理解这些系统以及当前和未来电子设备的最佳性能至关重要。该项目涵盖了威斯康星大学麦迪逊分校1 GeV同步辐射中心现有国家资源的几种实验光谱技术。这项工作将为研究中的半导体和金属表面的氧化或氮化等重要催化反应的电子结构、原子几何形状和微观机制提供有价值的信息。最近的两项美国专利表明了这项研究对金属/半导体界面应用和技术领域的潜在影响。