Presidential Faculty Fellow: X-Ray Optics

这项研究的目的是继续发展和培训学生在高分辨率软X射线光学技术的显微镜和光刻。在附近布鲁克海文国家实验室的国家同步加速器光源上使用波动器，我们能够获得波长为1-5 nm(可见光波长为400-700 nm)的相干X射线光束。PI已经开发了一种扫描X射线显微镜，它将这些软X射线聚焦到50 nm的光点，并且该显微镜被用于湿的透射显微镜研究，厚的生物标本，并用于开发新的成像模式。PI还展示了以50 nm分辨率记录生物样品的X射线全息图的能力，我们在全息术方面的努力和激光实验室的开发正在朝着记录具有PSEC曝光时间的20 nm分辨率全息图的目标前进，因此，在比辐射损伤更短的时间尺度内对样品进行成像。最后，PI还开发了一种用于未来集成电路X射线光刻制造的掩模设计方法，该方法基于无参考轴上计算全息图；希望将这种方法从计算机模拟带入实验演示。

This research is aimed at the continued development of and student training in high resolution soft x-ray optical techniques for microscopy and lithography. Using an undulator at the National Synchrotron Light Source at nearby Brookhaven National Laboratory, we are able to obtain coherent beams of x-rays with a wavelength of 1-5 nm (the wavelength of visible light is 400- 700 nm). The PI has developed a scanning x-ray microscope which focusses these soft x-rays to a 50 nm spot, and this microscope is being used both for transmission microscopy studies of wet, thick biological specimens, and for the development of new imaging modalities. The PI has also demonstrated the ability to record x-ray holograms of biological specimens at 50 nm resolution, and our efforts in holography and developments at laser labs are leading towards the goal of recording 20 nm resolution holograms with psec exposure times, thus imaging a specimen in a timescale shorter than that of radiation damage. Finally, the PI has also developed a method for designing masks for x-ray lithographic manufacture of future integrated circuits based on referenceless on-axis computed holograms; it is hoped to bring this method from computer simulation to experimental demonstration.