Presidential Faculty Fellow: X-Ray Optics

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This research is aimed at the continued development of and student training in high resolution soft x-ray optical techniques for microscopy and lithography. Using an undulator at the National Synchrotron Light Source at nearby Brookhaven National Laboratory, we are able to obtain coherent beams of x-rays with a wavelength of 1-5 nm (the wavelength of visible light is 400- 700 nm). The PI has developed a scanning x-ray microscope which focusses these soft x-rays to a 50 nm spot, and this microscope is being used both for transmission microscopy studies of wet, thick biological specimens, and for the development of new imaging modalities. The PI has also demonstrated the ability to record x-ray holograms of biological specimens at 50 nm resolution, and our efforts in holography and developments at laser labs are leading towards the goal of recording 20 nm resolution holograms with psec exposure times, thus imaging a specimen in a timescale shorter than that of radiation damage. Finally, the PI has also developed a method for designing masks for x-ray lithographic manufacture of future integrated circuits based on referenceless on-axis computed holograms; it is hoped to bring this method from computer simulation to experimental demonstration.